Mitsubishi Denki Kabushiki Kaisha

Naomitsu Fuzishita

Shigeo Sasaki

Kazuhiro Shono

Akira Shuhara

Yasushi Matsumura

In an ion beam irradiating apparatus for providing a neutralized ion beam to a sample, there are provided an ion source, an accelerating device and an ion beam selecting device to which the accelerated and selection ion beam is irradiated. This irradiating apparatus further includes an ion neutralizer positioned between the selecting device and the sample, and includes: an electron beam emitting source for emitting an electron beam; a first electron scatter preventing electrode for preventing the electron beam emitted from the electron beam emitting source from being scattered outside the ion neutralizer; a second electron scatter preventing electrode for preventing the electron beam induced into the specified ion beam from being scattered in a direction opposite to an ion irradiating direction; and a control electrode for controlling a traveling velocity of the electron beam emitted from the electron emitting source so as to drift the emitted electron beam toward the sample, thereby neutralizing the selected ion beam at a location adjacent to a surface of the sample that is being irradiated.

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Hyogo, Japan

Naomitsu Fuzishita