Mitsubishi Chemical Corporation

Mitsubishi Petrochemical Company Limited

Nihon Nohyaku Co., Ltd.

Nippon Kasei Chemical Company Limited

Naoko Sumitani

Takeshi Nakamura

Tomoko Maeda

Takeshi Sawai

Shuji Ichikawa

Yuji Ohgomori

Tomohiro Kato

Eiji Dejima

Tomohiro Kyotani

Hiroyuki Hayashi

Ken Tanaka

Masanori Yamazaki

Toshiki Fukuchi

Shingo Namiki

Toshiki Monden

Haruhiko Kusaka

Shuko Okui

Hisatoshi Uehara

Manabu Katsurada

Nobuo Kyomura

Yuuichi Hirami

Takako Takahashi

Hiroki Shibata

Ritsuko Yamauchi

Takahiro Yoneyama

Kazuya Okano

Michi Watanabe

Akiko Miyauchi

Yoshie Takami

Akiko Yabe

Toshitaka Suzuki

Miwa Shirasaki

Takahiro Sugawara

Akiko Fujita

An object of the present invention is to provide a silica particle having excellent polishing characteristics and storage stability. The present invention relates to a silica particle in which a proportion of silanol groups present on a surface represented by (x/y)×100% is 15% or less, where a content of silanol groups on the surface is x mass % and a content of bulk silanol groups is y mass %.

Silica particle and production method therefor, silica sol, polishing composition, polishing method, method for producing semiconductor wafer and method for producing semiconductor device

An object of the present invention is to provide a silica particle having excellent polishing characteristics and storage stability, a method for producing the silica particle, a silica sol containing the silica particles, and a polishing composition containing the silica sol. Another object of the present invention is to provide a polishing method, a method for producing a semiconductor wafer, and a method for producing a semiconductor device, which are excellent in productivity of an object to be polished. The silica particle in the present invention satisfies formula (1): y≥4.2 where a d value measured by wide-angle X-ray scattering is y Å.

The present invention provides a polyhydric phenol compound which has an excellent alkali resistance and which does not cause a deterioration in color even when used as a resin raw material or a color developer. The polyhydric phenol compound includes: a bisphenol compound (A) represented by the following Formula (1) and a trisphenol compound (B) represented by the following Formula (2): [wherein Rrepresents a monovalent aliphatic hydrocarbon group having from 6 to 24 carbon atoms; each of R, R, R, Rand Rrepresents a monovalent hydrocarbon group having from 1 to 15 carbon atoms; and each of a, b, c, d and e represents an integer from 0 to 4];

Polyhydric phenol compound and method of producing same

The invention relates to a resin composition which comprises a polymer having a divalent oligofluorene as a repeating unit therein, wherein the divalent oligofluorene contains at least two fluorene units optionally having a substituent, and the 9-positioned carbon atoms of the fluorene units bond to each other via a direct bond or via an alkylene group optionally having a substituent, an arylene group optionally having a substituent, or an aralkylene group optionally having a substituent, and a ratio of a retardation measured at a wavelength of 450 nm (Re450) to a retardation measured at a wavelength of 550 nm (Re550) satisfies the following formula (2): Re450/Re550&#x2266;1.0.

Resin composition, stretched film, circularly polarizing plate, and image display device

The present invention provides a polymerizable inorganic particle dispersant that can achieve an inorganic-organic composite particle and inorganic-organic resin composite material, which have a high refractive index and a high Abbe's number, i.e., which can achieve both of a high refractive index and a high Abbe's number that is non-conventional in a composite with an inorganic particle. The present invention relates to a polymerizable inorganic particle dispersant comprising a compound which includes the following functional groups A, B and Q: A: Polymerizable functional group; B: Carboxyl group, Oxo acid group containing a phosphorous or Oxo acid group containing sulfur; and C: Sulfur-containing divalent or more aliphatic hydrocarbon group, which may contain a hetero atom other than sulfur.

Polymerizable inorganic-particle dispersant, inorganic-organic composite particles containing said polymerizable inorganic-particle dispersant, and inorganic-organic resin composite material

The invention provides a novel pest control agent having a high systemic activity and a high safety with reduced adverse influences on the environment neighboring the place to which the agent is applied, and a process for producing the same. Namely, the present invention relates to a novel 1-aryl-3-cyano-5-heteroarylalkylaminopyrazole derivative represented by the following general formula (1) and a process for producing the same, and a pest control agent containing the same as an active ingredient.(wherein X represents N or C-halogen, Rrepresents an alkyl group, an alkenyl group, an alkynyl group, or a haloalkyl group, Rrepresents hydrogen atom, an alkyl group, or an acyl group, Rrepresents hydrogen atom or an alkyl group, A represents any one of the groups represented by A-1 to A-4, Rrepresents hydrogen atom, an alkyl group, a halogen atom, and n represents 0, 1, or 2, provided that Ris a haloalkyl group except a perhaloalkyl group when A is A-1 and n is 0, and that n is not 0 when A is A-4.).

Pyrazole derivative, production process thereof, and pest control agent containing the same as active ingredient

A process for producing 1,4-butanedial monoacetal by reacting acrolein acetal with a synthesis gas containing carbon monoxide and hydrogen, in the presence of a rhodium catalyst and an accelerator of formula (I) ##STR1## wherein R.sup.1 and R.sup.2 each, independently, denote a hydrogen atom, a C.sub.1 -C.sub.20 alkyl group or a C.sub.6 -C.sub.20 aryl group, or R.sup.1 and R.sup.2 together form a --(CH.sub.2).sub.n -- group, n is an integer of from 2 to 7, R.sup.3 and R.sup.4 each, independently, denote halogen or a trifluoromethyl group, and p and q are each, independently, an integer of from 0 to 3, which process can also be extended to the hydroformylation of other compounds which contain an olefin group in a terminal position.

Process for the selective hydroformylation of terminal olefin groups and

A modified strongly acidic ion exchange resin of a sulfonic acid type is disclosed. Modification is conducted by ionically binding a particular N,N-di-substituted mercaptoalkylamine to a strongly acidic ion exchange resin of a sulfonic acid type. The N,N-di-substituted mercaptoalkylamine is specifically represented by the following formulae: ##STR1## wherein R.sup.1 represents hydrogen or a C.sub.1-6 alkyl group, R.sup.2 and R.sup.3 independently represent a C.sub.1-10 alkyl group, a and b denote 0-3, respectively, a+b denotes 2 or 3, and m denotes 4 or 5. The modified ion exchange resin makes an improved catalyst in the preparation of a bisphenol by the condensation reaction of a phenol with a ketone.

Modified ion exchange resins and use thereof

A process for preparing 2-hexene-1,6-dial comprising dimerizing 2-propenal in the presence of an organometallic compound of the group VIII metal. The desired compound can be obtained under mild conditions with industrial advantages.

Process for preparing 2-hexene-1,6-dial

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Kanagawa, Japan

Naoko Sumitani