Sumitomo Chemical Company, Limited

Naoki Takeyama

Takehiro Kusumoto

Yuji Ueda

Hiromi Ueki

Shigeki Yamamoto

Yoshiki Hishiro

Yasunori Uetani

Yuko Yako

Haruyoshi Osaki

Masumi Suetsugu

Ryotaro Hanawa

Masanori Shinada

Yuko Nakano

Koji Ichikawa

Kenji Takahashi

Susumu Miyazaki

Fumiyoshi Urano

Hirotoshi Nakanishi

Jun Tomioka

Takeshi Hioki

Akira Kamabuchi

Hirotoshi Fujie

Teijiro Kitao

Hiroshi Takagaki

Nobuhito Fukui

Shigeaki Chika

Masaru Matsuoka

Hiromi Oka

Kouichi Satou

A negative type resist composition is provided, which provides excellent resolution, satisfactory profile and outstanding process stability; is suitable for exposure using deep ultra violet ray; and comprises alkali soluble resin, acid generator, crosslinking agent, and a basic compound represented by the following formula (I)wherein, A representssulfide group, disulfide group orbivalent aliphatic hydrocarbon residue which may be optionally interrupted by imino group,sulfide group, or disulfide group,X represents nitrogen atom or C(NH), and Rand Rindependently represent hydrogen or alkyl.

Negative type resist composition

A resist composition comprising (a) at least two kinds of polymers which become alkali-soluble by the action of an acid, (b) as a photoacid generator, a combination of an alkylsulfonyl diazomethane compound and a triarylsulfonium arylsulfonate compound or a diaryliodonium arylsulfonate compound, and (c) a solvent is excellent as a chemically amplified resist composition to give excellent pattern shape and very fine line-and-space, particularly when exposed to lights having a wavelength of 300 nm or less.

Resist composition

A negative type resist composition is provided, which provides excellent resolution, satisfactory profile and outstanding process stability: is suitable for exposure using deep ultra violet ray; and comprises alkali soluble resin, acid generator, crosslinking agent, and a basic compound represented by the following formula (I)

A positive working photoresist composition is provided which comprises a resin which is converted to alkali-soluble from alkali-insoluble or alkali slightly soluble by the action of an acid; an acid generator; and a nitrogen-containing cyclic compound represented by the following formula (I):

Positive working photoresist compositions comprising a nitrogen-containing cyclic compound

The present invention provides a positive photoresist composition comprising an alkali-soluble resin containing a copolymer of p-vinylphenol or a derivative thereof and styrene, a dissolution inhibitor and a photo-induced acid precursor. This positive photoresist composition exhibits excellent sensitivity and resolution while maintaining excellence in other properties such as heat resistance, film thickness retention, adhesion and profile, in far ultraviolet ray lithography.

Positive photoresist composition

A positive photoresist composition having excellent various performances (e.g. resolution, resistance to time delay effect, profile), small PEB dependence as well as excellent sensitivity, film retention and coatability, which comprises a polyvinylphenol resin whose phenolic hydroxyl group is partially protected; a sulfonate of a N-hydroxyimide compound as an acid generator; an amine compound; and an electron donor having a redox potential of not more than 1.7 eV is provided.

Photoresist composition

N-(10-camphorsulfonyloxy)-succinimide represented by the formula (I): ##STR1## is provided, which can be produced by reacting N-hydroxysuccinimide with 10-camphorsulfonic acid, a salt thereof or a halide thereof. Using the compound as an acid generating agent, a resist composition can be obtained by including an alkali-soluble resin having a protective group removable by the action of an acid; and the resist composition is excellent in heat resistance, ratio of residual film thickness after developing, uniformity of film thickness, profile, photospeed and resolution and is improved in the time delay effect and attachment of pattern.

Succinimide derivative, process for production and use thereof

A photosenstive resin composition for color filter having excellent resolution, heat resistance and transparency, etc., characterized in that it contains a novolak resin having the recurring units such as those represented by the general formula (I): ##STR1## �wherein R.sub.1 to R.sub.5 represent hydrogen, alkyl, etc., and R.sub.6 and R.sub.7 represent hydrogen, alkyl, etc., provided that ##STR2## is coordinated at the o- or p-position in relation to the --OH group! and having a molecular weight of about 1,000-50,000, a solvent and a dye or pigment.

Photosensitive resin composition for color filter

A positive-working photoresist composition which exhibits a high sensitivity and a high resolution in addition to excellent characteristics such as heat resistance, film retention ratio, coatability and profile;

This invention provides a positive photoresist composition comprising an alkali-soluble resin, a dissolution inhibitor and a photo-induced acid precursor, wherein said alkali-soluble resin is obtainable through a condensation reaction of a compound represented by the general formula (I): ##STR1## wherein R.sub.1 to R.sub.9 each represent hydrogen atom, halogen atom, alkyl group, alkenyl group, --OH group or the like, provided that at least one of R.sub.1 to R.sub.9 is --OH group and at least two hydrogen atoms are attached to the o- or p-position of the --OH group, and an aldehyde. This positive photoresist composition is excellent in performances such as resolution, profile, sensitivity, etc.

An azo dye for use in color filters soluble in alkaline aqueous solutions and organic solvents and having in one molecule at least one sulfonamido group of which one hydrogen atom is substituted; and a method for producing a color filter having a plurality of color filter elements which comprises the steps of a) coating a substrate with an organic solvent solution of a photoresist composition containing said azo dye and drying the coat to form an adhering layer, b) exposing a specific part of said layer to radiation ray, c) developing the exposed or unexposed region with alkali to form a colored pattern, and d) repeating the steps a)-c) on every dye of different color present in said composition.

Photoresist composition for use in color filters

Azo dyes for use in color filters and method for production of color

A curable resin composition used as an overcoat film of a color filter for a color liquid crystal display device contains polyglycidyl methacrylate and a curing agent comprising a carboxylic anhydride and a bisphenol S, a halogen- or (halo)alkyl-substituted derivative thereof, or a diaminophenol. The cured composition is used as an overcoat film with good heat resistance on a color filter of a liquid crystal display device.

Curable resin composition for overcoat film of color filter and color

A negative or positive photoresist composition which comprises an alkali soluble resin containing at least one resin selected from the group consisting of a partially alkyletherified polyvinylphenol and a partially alkyletherified hydrogenated polyvinylphenol, a photo-induced acid precursor containing at least a kind of sulfonic acid ester of N-hydroxyimide compounds and crosslinking agent or dissolution inhibitor, and this photoresist composition is excellent in various properties such as heat resistance, film thickness retention, coating property, profile and the like, and further exhibits high sensitivity and high resolution when far ultraviolet rays including excimer laser is used as the light source. It also hardly cause a scam during the developing process.

Photoresist composition containing alkyletherified polyvinylphenol

A color filter having the thickness of 3 .mu.m or smaller and, on a substrate, having color filter elements which have different colors each other and are made from a resist compositions comprising an alkali soluble resin and dyes having a specific color within the wave length range from 400 nm to 700 nm, wherein each of the color filter elements has the minimum light transmittance of 25% or smaller, and the color filter is excellent in various properties such as resolution, color tone, color reproductivity and color depth and it has a small thickness.

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Settsu, Japan

Naoki Takeyama