Kabushiki Kaisha Topcon

Naoki Nakazawa

Toshifumi Mihashi

Yoko Hirohara

Tatsuo Yamaguchi

Koji Nakajima

Katsuhiko Kobayashi

Gaku Takeuchi

Masahiro Shibutani

An ophthalmic apparatus comprises a projection system in which a pattern member is provided with a predetermined pattern for measuring the shape of the cornea of an eye of a subject, the predetermined pattern is thereby projected on the cornea of the eye of the subject, and an optical observation system in which light flux having a shape of the predetermined pattern emitted from the projection system is reflected at the cornea of the eye of the subject, the eye of the subject is observed by the light reflected by the cornea. A surface at the eye of the subject side of the pattern member is coated with a paint having a filtering property that transmits infrared light and blocks visible light.

Ophthalmic apparatus

A model eye for an eye characteristic measuring device and a calibration method for the model eye. The model eye can have various aberrations and/or power characteristics to be formed by a combination of a refractive-type lens and a phase plate for adding aberration and can be used to confirm the accuracy of wavefront measurement or the like of the eye characteristic measuring device. The model eye includes an anterior eye lens forming a predetermined power to be given to the model eye, a diffusion surface diffusing and reflecting incident light, the diffusion surface being disposed at an image point position corresponding to the predetermined power in relationship to the anterior eye lens, and an aberration adding member giving a predetermined aberration to an area between the anterior eye lens and the diffusion surface. Power and aberration required for the model eye are formed by the anterior eye lens and the phase plate.

Model eye for eye characteristic measuring device and calibration method for the same

The invention provides an apparatus which detects light quantity distribution characteristics of a measuring target image projected to a fundus of an eye to be inspected and measures eye optical characteristics from the light quantity distribution characteristics. A projecting optical system has a light source and projects a measurement target to a fundus of an eye to be inspected by bundle of rays emitted from the light source, and a light receiving optical system condenses the bundle of rays reflected from the fundus of the eye. A photoelectric detector detects light quantity distribution characteristics of an image formed by the light receiving optical system, and an arithmetic unit measures eye optical characteristics of the eye based on a signal output from the photoelectric detector. A deflecting optical member for deflecting bundle of rays incident into both optical paths of the projecting optical system and the light receiving optical system is arranged so as to be rotatable.

Eye characteristic measurement apparatus with speckle noise reduction

The present invention relates to an apparatus for precise measurement of optical characteristics, and has an object to provide an optical characteristic measuring apparatus comprising a position change unit for changing the positions of beams transformed by a first transforming member, wherein a first light source emits a luminous flux of a first wavelength, a first illumination optical system illuminates a minute area on the retina of the eye under examination with the luminous flux from the first light source, a first light receiving optical system leads light to a first light receiving unit through a transforming member for transforming the luminous flux having undergone at least one of transmission and reflection at at least one surface of the object of measurement into at least nine beams, a position change unit changes the positions of the beams transformed by the first transforming member, and an arithmetic unit can determine optical characteristics of the object of measurement based on a first signal from the first light receiving unit corresponding to the angle of inclination of the luminous flux.

Growing community of inventors

Tokyo, Japan

Naoki Nakazawa