Rigaku Industrial Corporation

Rigaku Corporation

Naoki Kawahara

Kouichi Aoyagi

Yasujiro Yamada

Shinya Hara

Hideaki Takahashi

Kiyoshi Ogata

Kazuhiko Omote

Yoshiyasu Ito

Asao Nakano

Hiroshi Motono

Sei Yoshihara

Shigematsu Asano

Katsutaka Horada

Takashi Shoji

Shiro Umegaki

Makoto Doi

Akifusa Higuchi

Takao Kinefuchi

Akira Arake

Minoru Inoue

Muneo Yoshida

Takashi Misonoo

Takashi Sakamoto

An X-ray thin film inspection device of the present invention includes an X-ray irradiation unitinstalled on a first rotation arm, an X-ray detectorinstalled on a second rotation arm, and a fluorescence X-ray detectorfor detecting fluorescence X-rays generated from an inspection target upon irradiation of X-rays. The X-ray irradiation unitincludes an X-ray optical elementcomprising a confocal mirror for receiving X-rays radiated from an X-ray tube, reflects plural focused X-ray beams monochromatized at a specific wavelength and focuses the plural focused X-ray beams to a preset focal point, and a slit mechanismfor passing therethrough any number of focused X-ray beams out of the plural focused X-ray beams reflected from the X-ray optical element

X-ray thin film inspection device

A doubly bent X-ray spectroscopic device () according to the present invention includes: a glass plate () which is deformed into a shape having a doubly bent surface by being sandwiched between a doubly curved convex surface () of a convex forming die () and a doubly curved concave surface (), of a concave forming die (), that matches the doubly curved convex surface (), and being heated to a temperature of 400&#xb0; C. to 600&#xb0; C.; and a reflection coating () configured to reflect X-rays, which is formed on a concave surface () of the deformed glass plate ().

Methods for manufacturing doubly bent X-ray focusing device, doubly bent X-ray focusing device assembly, doubly bent X-ray spectroscopic device and doubly bent X-ray spectroscopic device assembly

An X-ray fluorescence spectrometer which includes a calculating device () operable to calculate the theoretical intensity of secondary X-rays (), emanated from each of elements contained in a sample (), based on the assumed composition and then to successively approximately modify and calculate the assumed composition so that the theoretical intensity and the converted and measured intensity, which have been detected by a detecting device () and then converted in a theoretical intensity scale, can match with each other, to thereby calculate the composition of the sample (). The calculating device (), when calculating the theoretical intensity, performs a simulation to determine the theoretical intensity of the secondary X-rays () for each of optical paths, using the size of the sample (), and the intensity and the incident angle (&#x3c6;) of primary X-rays () impinged upon various areas of the sample surface () as parameters.

X-ray fluorescence spectrometer and program used therein

A calculating devicefor calculating the concentration of elements contained in a samplebased on the FP method is provided. The calculating deviceis operable to assume a concentration of unmeasured elements as far as unmeasured elements, of which fluorescent X-rays are not measured, are concerned, and, also, to utilize, in place of the secondary X-rays emanating from the unmeasured elements contained in the sample, scattered X-rays of the primary X-rays at least equal in number to the number of the unmeasured elements, of which concentrations are assumed, and including scattered X-rays of different wavelengths before they are scattered from the sample.

To provide an X-ray fluorescence spectrometer capable of providing a stable fluorescent X-ray intensity regardless of the presence of irregularities or the like on a surface of a sample to be analyzed, the X-ray fluorescence spectrometer includes an X-ray source including a primary X-ray limiting diaphragm An aperture of the primary X-ray limiting diaphragm is of a shape effective to allow change in intensity of fluorescent X-rays measured by a detector to be not higher than 1% in the event that a height of the sample surface relative to the X-ray source and the detector changes 1 mm at maximum.

X-ray fluorescence spectrometer

A fluorescent X-ray analyzer includes a detector ( ) for detecting fluorescent X-rays ( ) emitted from a sample piece ( ) to be analyzed, and a first collimator ( ) disposed between the sample piece ( ) and the detector ( ) supported for movement between inserted and retracted positions with respect to a path of travel of the fluorescent X-rays ( ) towards the detector ( ). The first collimator ( ) comprises a wall ( ) adjacent the sample piece ( ) that is stepped to provide stepped wall segments ( ) having respective apertures ( ) of varying diameters defined therein. The smaller the aperture, the closer it is to the sample piece ( ) when one of the apertures ( ) is selected according to a size of a target area of the sample piece ( ) to be measured and is then brought in register with the path of travel of the fluorescent X-rays ( ) towards the detector ( ).

Fluorescent X-ray analyzer

A fluorescent X-ray analyzing apparatus capable of being used as either a wavelength dispersive type or an energy dispersive type is provided, with which the analysis can be performed quickly and accurately. The fluorescent X-ray analyzing apparatus includes a detecting unit for detecting and analyzing fluorescent X-ray (,) emitted from at least one target area (,) of a sample (,) to be analyzed as a result of excitation of such target area (,) with a primary X-ray (,). The detecting unit includes a wavelength dispersive type detecting unit (,) including a spectroscope (,) and a first detector (,), and an energy dispersive type detecting unit (,) including a second detector (,) of an energy dispersive type. The angle &thgr;1 formed between a first path (,) of travel of the fluorescent X-ray from the target area (,) towards the spectroscope (,) and a surface of the sample (,) is equal to the angle &thgr;2 formed between a second path (,) of travel of the fluorescent X-ray from the target area (,) towards the second detector (,) of the energy dispersive type and a surface of the sample (,), but the second path (,) is shorter than the first path (,).

Fluorescent X-ray analyzer useable as wavelength dispersive type and energy dispersive type

An X-ray analyzing apparatus includes a drive unit for moving a sample, a plurality of field-limiting slits each having a slit size corresponding to the size of a measuring area of the sample, a selector unit for selectively bringing the field-limiting slits into a path of travel of the secondary X-ray between the sample and the detecting unit, a drive controller for controlling the drive unit to move the sample according to the size of the measuring area of the sample to a position at which the intensity of radiation of a primary X-ray towards the measuring area of the sample attains a maximum value; and a selector controller for controlling the selector unit to render only the secondary X-ray emanating from the measuring area of the sample to be incident upon the detecting unit.

X-ray analyzing apparatus with enhanced radiation intensity

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Takatsuki, Japan

Naoki Kawahara