Wako Pure Chemical Industries, Inc.

Naoki Katano

Fumiyoshi Urano

Motoshige Sumino

Shigeaki Imazeki

Masami Ishihara

Kazuhito Fukasawa

Tomoko Kiryu

A compound shown by the general formula [1](wherein R, Rand Rare each independently an aromatic hydrocarbon residual group, Yis an anion derived from a carboxylic acid having 3 or more carbon atoms with substituted fluorine atoms, and n is 1 or 2, provided that R, Rand Reach is not a phenyl group having substituents at an ortho and/or a meta position), and a composition consisting of the compound and a diazodisulfone compound are disclosed. Use of the compound or the compound as an acid generator for resists produces the effects of improving the profiles of ultra-fine patterns or diminishing sidewall irregularities in ultra-fine patterns. The compound is also useful as a cationic photopolymerization initiator.

Sulfonium salt compound

Agent for reducing substrate dependence

Growing community of inventors

Saitama, Japan

Naoki Katano