Nippondenso Co., Ltd.

Kabushiki Kaisha Toyota Chuo Kenkyusho

Naoki Hara

Yasunori Taga

Tadashi Ozaki

Hideya Yamadera

Yoshiki Seno

Haruhiko Inoue

Katsuhiko Ariga

A thin film resistor for a strain gauge prepared by physical or chemical vapor deposition. The resistor contains 60 to 98 atomic % of chromium, 2 to 30 atomic % of oxygen, and 0 to 10 atomic % of a metal or semiconductor. These constituents are uniformly distributed. The thickness of the film is between 0.01 and 10 .mu.m. The metal is at least one of Al, Ti, Ta, Zr and In, and the semiconductor is at least one of silicon, germanium and boron. The thin film resistor has excellent resistance-strain characteristics and resistance-temperature characteristics, as well as high sensitivity and mechanical strength.

Thin film resistor for strain gauge

Growing community of inventors

Mie, Japan

Naoki Hara