Fanuc Corporation

Renesas Electronics Corporation

Mitsubishi Electric Corporation

Nippon Filcon Co., Limited

Naoki Fujita

Teruyuki Matsumura

Koichi Murata

Atsushi Shima

Hiroyuki Nakamura

Hajimu Kishi

Hajime Suzuki

Hideaki Maeda

Yoshihiro Shinosaka

Noritake Nagashima

Keiichiro Miyajima

Haruyuki Ishikawa

Masahiro Yoshikawa

Tomohiko Aika

Takehiko Tatsuno

Tetsuya Shimizu

Kazuhiro Chisaka

Toru Hanagata

Kota Miyamoto

Kozo Kamada

Megumi Taguchi

A web support with a high degree of patterning freedom and excellent durability, a production method therefor, and a patterning method. The web support is used when applying a pattern to a nonwoven substance by jetting a high-pressure water stream on a web. The web support production method comprises: a step of preparing a flat metal base material; a step for forming, by etching, a first water conduction hole and second water conduction hole that pass through the front surface of the base material to the back surface, and a recess on the front surface of the base material that includes the first water conduction hole and that corresponds to the pattern; and a step for forming the base material into a cylindrical main body section by welding the edges of the base material to each other.

Web support, production method therefor, and patterning method

Reliability of a semiconductor device is improved. In the semiconductor device SA, a snubber capacitor pad SNP electrically connected to the capacitor electrode of the snubber capacitor is formed on the surface of the semiconductor chip CHP.

Semiconductor device and manufacturing method thereof

An output terminal portion includes: an output terminal that includes: a shaft portion on which an external screw thread portion is formed; and a head portion; and an intermediary member that includes: a fastening seat on a first axial end of which a nut portion is formed integrally, and that is mounted so as to be fitted over the shaft portion such that a second axial end protrudes axially out of a bushing, the bushing is mounted to the intermediary member such that axial movement of the bushing is constrained, and an external output wire is mounted to a second axial end surface of the fastening seat in a state of contact by a fastening force from a fixing nut that is screwed onto the external screw thread portion such that the external output wire is fixed by fastening between the fixing nut and the fastening seat.

Automotive rotary electric machine

After embedding a silicon oxide film within a second trench that opens in a semiconductor substrate using a silicon nitride film as a hard mask, the silicon oxide film over the silicon nitride film is polished, and then, wet etching is performed before a step for removing the silicon nitride film, and thereby the upper surface of the silicon oxide film within a first trench opened in the silicon nitride film is retreated.

Method for manufacturing semiconductor device

Method of programming primary and secondary machining operations using

Numerical control machining animation with workpiece and tool movement

Method of plotting loaded conditions

Numerical control apparatus having a work simulation function

Method for restarting punch press machine and numerical controller

NC sentence creation system

NC program drawing method

Apparatus for detecting an excessive position error in a servo system

Tool changing method

Method of creating NC program for pocket machining

Conversational-type programming apparatus

Growing community of inventors

Tokyo, Japan

Naoki Fujita