Other

Jeol Ltd.

Sony Corporation

Naoki Date

Setsuo Norioka

Yuichi Aki

Masanobu Yamamoto

Jun Sasaki

Minoru Takeda

Seiichi Nakagawa

Mitsuru Koizumi

Yoshihisa Miura

Hiroshi Kawase

Toshiaki Miyokawa

Gakuo Komatsubara

Tadashi Hattori

Tetsuo Abe

Kouki Okawauchi

Hironori Fujita

Yoshio Ishimori

A testing apparatus using a scanning electron microscope for enabling tests and measurements on any part of a test subject in a nondestructive way without being limited by a size of the test subject, which is, a testing apparatususing a scanning electron microscope for performing tests and measurements on any part of a test subject in a nondestructive way by using a scanning electron microscope, comprising a local vacuum formation portionfor forming a local vacuum region by blocking around a part to be tested of the test subject from the outside air, wherein the local vacuum formation portion comprises an exhaust portion for exhausting to form a partial vacuum region, a float meansfor floating the whole local vacuum formation portion above the test subject by emitting a compressed gas to an outer circumference portion of the local vacuum formation portion and a length measuring meansfor measuring a distance between the test subject and the local vacuum formation portion for controlling floating of the local vacuum formation portion by the float means.

Testing apparatus using scanning electron microscope

An electron beam irradiation system has a pumping block at an end of a microscope column of electron optics. The system has the rotary stage, the microscope column for directing an electron beam at the target on the rotary stage, the pumping block for evacuating air in the gap between the column and the target, a moving mechanism for sliding the rotary stage between a working position and a mounting position, and a cover member. In the working position, the target is opposite to the column. The cover member is brought into intimate contact with the rotary stage or target to prevent vacuum deterioration when the rotary stage moves from the working position to the mounting position.

System and method for electron beam irradiation

An electron beam irradiation apparatus in a partial vacuum method is structured with a static pressure floating pad connected to a vacuum chamber containing an electron beam column and in a condition that the static pressure floating pad is attached to a subject to be irradiated without contacting, and an electron beam irradiating the subject to be irradiated through an electron beam path of the static pressure floating pad , whereby the vacuum chamber and the electron beam column can be maintained in the required degree of vacuum even in a condition that the static pressure floating pad is separated from the subject to be irradiated. A vacuum seal valve including a piston to open and close the electron beam path is provided within the static pressure floating pad . When the static pressure floating pad is separated from the subject , the vacuum seal valve is structured to be activated to close the electron beam path so as to prevent the air from flowing into the vacuum chamber . In this structure, the vacuum seal valve is formed with a round shaped cross section and in a tapered shape with a narrow tip so as to accomplish high vacuum seal without a gap, so that the degree of vacuum in the vacuum chamber and the electron beam column can surely be maintained.

Electron beam irradiation apparatus and electron beam irradiating method

An electron beam irradiation system for shooting an electron beam at a master disk to make recordings. This system is capable of focusing the beam easily and accurately in a corresponding manner to the master disk, thus permitting accurate recordings. The system has a support mechanism portion holding the master disk on it. The support mechanism portion has a slide table on which a focusing stage is placed. The focusing stage has a knife edge and a Faraday cup. The knife edge is located immediately beside the master disk. When recordings are made, an electron beam is first shot at the focusing stage and brought to focus. Then, the beam is shot at the master disk, thus making recordings.

A charged particle beam scanning device is provided with two coordinates conversion circuits. For rotating the scanning direction of the charged particle beam, one of the coordinates conversion circuit is connected between a scanning signal generator and a magnification circuit, the output of which is supplied to a deflecting means for scanning the charged particle beam over the specimen surface, as in the case of a conventional device. Another coordinates conversion circuit is used for keeping independent operation of the image rotation and the image shift. This coordinates conversion circuit converts the output signal of a d.c. signal generator for image shift, and the converted signal is added to the input signal of the said magnification circuit.

Charged particle beam scanning device

An upper deflection coil comprising a toroidal coil. A lower deflection coil comprising a saddle-shaped coil to minimize the combined inductance of the upper and lower deflection coils. A single scanning signal generator which supplies the deflection coils with scanning signals having different frequencies, ranging from low scanning speeds to television scanning speeds. Thus, no image shift occurs when changing scanning speeds in between television scanning speeds and other scanning speeds.

Electron beam apparatus

Growing community of inventors

Tokyo, Japan

Naoki Date