Other

Tokyo Electron Limited

Nec Corporation

Nippon Steel Corporation

Matsushita Electric Works, Ltd.

Asahi Kasei Kogyo Kabushiki Kaisha

Toppan Printing Co., Ltd.

Nhk Spring Co., Ltd.

Japan Radio Co., Ltd.

Radial Antenna Laboratory, Ltd.

Naohisa Goto

Makoto Ando

Nobuo Ishii

Yasuyoshi Yasaka

Tadahiro Ohmi

Yasuo Kobayashi

Hiroyuki Arai

Yoshiharu Ito

Kunitaka Arimura

Katsuji Kimura

Masaki Hirayama

Yukio Yokoyama

Tetsuya Goto

Naoki Yokoyama

Tamotsu Morimoto

Masahiro Uematsu

Katsuya Tsukamoto

Takashi Ojima

Yasuhiro Okazaki

Mitsuo Mori

Nobuharu Takahashi

Akihiko Hiroe

Jiro Hirokawa

Kiyoshi Seshimo

Masanori Haga

Nobuhiro Kuga

Motoaki Uchida

Junichi Takada

Yasuhiro Horike

Ryuji Teramoto

Masaki Takayama

Tatsuya Shirai

A distributor () includes a square waveguide () to be connected to a microwave oscillator () and a square waveguide () having a plurality of openings () formed in a narrow wall (B). The square waveguide () is hollow. A wave delaying member () having a relative dielectric constant &#x2208;is arranged in the square waveguide (). Narrow walls (A,A) of the two square waveguides () are brought into contact with each other, and a communication hole () through which the two waveguides () communicate with each other is formed in the narrow walls (A,A). The widths of the two waveguides () do not become narrow at their connecting portion even if the width of the communication hole () is decreased. Thus, a band of a frequency that can pass through the connecting portion is suppressed from becoming narrow. Consequently, reflection loss that occurs when the frequency of electromagnetic waves to be input to the distributor () changes can be decreased.

Distributor and distributing method, plasma processing system and method, and process for fabricating LCD

A microwave plasma processing apparatus includes a processing vessel, a microwave generator, a waveguide guiding a microwave formed by the microwave generator, and a microwave emitting member emitting the microwave with wavelength compression by a retardation plate, wherein the waveguide has a single microwave output opening in a location corresponding to a central par of the microwave emitting member.

Microwave plasma processing apparatus, microwave processing method and microwave feeding apparatus

A plasma-assisted processing system has a lifting mechanism capable of vertically moving a microwave power unit and a waveguide to adjust the level of a planar slot antenna disposed on an expanded lower end part of the waveguide. A space extending under the antenna is surrounded by a shielding member. An optical sensor having an array of photosensors is disposed on the outer side of a window formed in the side wall of a vacuum vessel to monitor the lower limit level of a cease region for a plasma (cease level). An ideal distance between the cease level and the antenna is determined beforehand and the level of the antenna is adjusted on the basis of a measured cease level so that the antenna is spaced the ideal distance apart from the cease level. Since the difference between the cease level and a level X for the cutoff density of an X-wave is fixed, the level X may be monitored instead of the cease level.

Plasma-assisted processing system and plasma-assisted processing method

Plasma processing apparatus and plasma processing method

An above deck unit for an AIS (automatic identification system) is externally installed on a ship. The above deck unit includes a radio circuit and an associated antenna for transmitting and receiving a message, a position detector and an associated antenna, associated controller and power supply, and a container for storing these elements. An inboard transmission path, e.g., a cable, connects the outdoor unit for the AIS and an AIS display serving as an interface means for the crew. A signal to be transmitted through the inboard transmission path is a processed, for example, an amplified signal, rather than an unprocessed output of a VHF antenna. Therefore, problems of signal loss or degradation along the inboard transmission path are unlikely to occur. Because the unit is incorporated within a single container, it can easily be installed and transferred. With this antenna complex, it is also possible to suppress interference between antennas.

Above deck unit for automatic identification system

In the plasma processor, the microwaves generated from a microwave generator ( ) are led to a plane antenna ( ), which in turn introduces exponentially attenuating microwaves into a container ( ) that processes an object (W) in plasma. Microwave absorption device ( ) provided in the circumference of the plane antenna ( ) absorbs microwaves propagating from the center of the plane antenna ( ) and suppresses the reflection. As a result, the microwaves reflected in the circumference of the plane antenna ( ) and returned to the center are decreased to some degree, and the electromagnetic field distribution of the microwave becomes uniform.

Plasma processing apparatus

Plasma treatment system

A plasma processing apparatus has a vacuum vessel, a high-frequency power generator that generates a high-frequency wave, a waveguide for propagating the high-frequency wave generated by the high-frequency power generator into the vacuum vessel to produce a plasma by ionizing a processing gas supplied into the vacuum vessel and to process a semiconductor wafer supported on a support table in the vacuum vessel. A reflection coefficient measuring unit,is combined with a waveguide,to take data on a ratio &Ggr;,of advancing wave from the high-frequency power generator,and reflected wave from the plasma and phase &thgr; of reflection coefficient. Factors dominating the electron density of the plasma including the output power of the microwave power generator are controlled on the basis of the measured data, whereby the electron density is controlled and stable processing is ensured.

Plasma processing method and apparatus

A plasma processing apparatus comprises a processing container, a waveguide tube for guiding microwaves generated by a microwave generator, and a flat antenna member connected to the wave guide and disposed in the container to face a semiconductor wafer supported in the container. The antenna includes a plurality of short slits concentrically or spirally arranged in the antenna. The slits are spaced apart in the widthwise direction at intervals of 5% to 50% of a guide wavelength of the microwave, and each of the slits has a length of +30% of the guide wavelength centered with respect to half of the guide wavelength.

Polarization-universal radial line slot antenna

A slotted leaky waveguide array antenna of a one-axis tracking type wherein a feed section including a feed probe is kept in a stationary state to thereby keep a converter in a stationary state and a desired beam width is set in a tilt direction, includes a plurality of radiation waveguides arranged adjacent and parallel to each other, each of which has a plurality of slots arranged in a waveguide axial direction, and a feed waveguide for distributing to the respective radiation waveguides electromagnetic waves received through a feed section from a converter, and the antenna rotates in a substantially horizontal plane to track an azimuth direction, wherein the feed waveguide has a first section extended along one ends of the radiation waveguides and a second section extended from the feed section provided in the rotary center of the slotted leaky waveguide array antenna to the center of the first section, and wherein the radiation waveguides are formed with crossed slots having an identical offset, and the number of the crossed slots is preferably selected between 13 and 17.

Slotted leaky waveguide array antenna

A low profile polarization diversity planar antenna capable of effectively separating the horizontal and vertical polarization. The antenna combines a notch antenna (A) and a patch antenna (B) in a low profile structure. The notch antenna comprises a ground plate (10), a feed plate (20), and a radiator plate (30) which are stacked in a spaced relation. The radiator plate is shorted to the ground plate at its center and formed in its periphery with at least two radial notches (38). The feed plate carries feeder probes (27) each located adjacent to each one of the notches for feeding the notch antenna. The patch antenna comprises a patch (40) stacked above the radiator plate (30). The patch (40) is grounded at one portion thereof and has a feed point spaced from the grounded portion for feeding the patch antenna. The patch is grounded to the radiator plate and has a diameter smaller than the radiator plate. Thus, the notch antenna and the patch antenna have individual radiator elements with the radiator plate rendered as the ground plane for the patch antenna, the notch and patch antennas exhibit less mutual coupling so as to effectively separate horizontal polarization made by the notch antenna from vertical polarization by the patch antenna.

Low profile polarization diversity planar antenna

A conductive layer is formed on one surface of an insulating substrate. Notches are formed in the conductive layer to be axially symmetric at equal angular intervals of 120.degree.. A feeding line of a notch antenna is formed on the other surface of the substrate. The feeding line has a C-shape and wide portions for adjusting the phases of excitation of the notches, and receives power at its one point. A ground plate is arranged to be parallel to the substrate. A feeding rod is connected to the conductive layer. The conductive layer and the ground plate are short-circuited by impedance matching pins. The matching pins are integrally formed with the ground plate. The notches and the feeding line constitute an notch antenna, and the feeding rod, the ground plate, the conductive layer, and the matching pins constitute a capacity loaded monopole antenna. To resonate these antennae at a plurality of resonant points, slits are formed in the conductive layer to be axially symmetric at equal angular intervals of 120.degree., and branch lines are connected to feeding lines. The slits resonate the capacity loaded monopole antenna at a plurality of frequencies. The branch lines resonate the notches at a plurality of frequencies. When the number of branch lines, the number of slits, and the like are adjusted, a diversity antenna covering a plurality of bands can be obtained.

Combined capacitive loaded monopole and notch array with slits for

An inner-feed-type planar antenna of single-layered structure excited by an axially symmetric mode for propagating radio waves from the center toward the outer periphery within a propagation layer having an antenna surface. If the planar antenna is used for transmission, it is provided with a plurality of coupling slots formed and arrayed in one surface of an axially symmetric mode waveguide member in such a manner that the coupling factor of the external radiation is high at the outer periphery and becomes successively lower as the center is approached. A spiral or ring-shaped terminating slot is provided in the antenna surface at the outer portion of the axially symmetric mode waveguide member. A region not coupled with the outer portion is provided at the center of the antenna surface. Furthermore, the planar antenna is provided with a reflector member arranged along the terminating slot for reflecting a propagating radio wave between the inner and outer portions of the axially symmetric mode waveguide member. A comparatively flat aperture distribution in which the electromagnetic field is uniform can be obtained. In addition, by providing the central portion with a non-radiating region, long-line effect is suppressed and bandwidth enlarged.

Single-layered radial line slot antenna

This invention provides a flat circular waveguide device which permits uniform radiation or power through a plurality of power-radiating openings in order to increase the antenna gain in the technical field of electric communications, especially, broadcasting antennas. To achieve such uniform radiation of power, the device is equipped with means for feeding power from a peripheral wall of a wave-guiding space, which is surrounded by metallic walls, toward a central part of the wave-guiding space.

Flat circular waveguide device

Growing community of inventors

Tokyo-to, Japan

Naohisa Goto