Argus Chemical Corporation

Adeka Argus Chemical Co., Ltd.

Other

Hitachi Chemical Company, Ltd.

Asahi Denka Kogyo Kabushiki Kaisha

Denso Corporation

Asahi Denka Kogyo K.k.

Asahi Denka Co., Ltd.

Adeka Corporation

Naohiro Kubota

Toshihiro Shibata

Motonobu Minagawa

Yutaka Nakahara

Kazuo Sugibuchi

Hajime Kakumaru

Yoshitaka Minami

Ryozo Arata

Shinya Mashimo

Atsushi Nishimura

Bunji Hirai

Kyohei Usami

Tohru Haruna

Manabu Yamada

Naomi Awano

Yasunori Takeuchi

Naoki Yamada

William E Leistner

Mitsuo Akutsu

Miho Ito

Nobuhide Tominaga

Ryoji Kimura

Akifumi Masuko

Koji Ishizaki

Motonubu Minagawa

Tomoyuki Oikawa

A nonaqueous electrolytic solution comprising an electrolyte salt dissolved in an organic solvent is disclosed. The nonaqueous electrolytic solution contains a silicon compound represented by formula (I): wherein Rrepresents an alkenyl group having 2 to 10 carbon atoms; Rand Reach represent an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms or a halogen atom; and X represents a halogen atom.

Nonaqueous electrolytic solution and nonaqueous secondary battery using the same

A nonaqueous electrolytic solution having an electrolyte salt dissolved in an organic solvent, which contains a silicon compound having an unsaturated bond which is represented by formula (I):wherein R, R, R, R, R, and Reach represent an alkyl group, an alkoxy group, an alkenyl group, an alkenyloxy group, an alkynyl group, an alkynyloxy group, an aryl group or an aryloxy group, each of which may have an ether bond in the chain thereof; n represents a number of from 0 to 5; when n is 1 to 5, X represents a single bond, an oxygen atom, an alkylene group, an alkylenedioxy group, an alkenylene group, an alkenylenedioxy group, an alkynylene group, an alkynylenedioxy group, an arylene group or an arylenedioxy group; provided that at least one of R, R, R, R, R, R, and X represents a group containing an unsaturated bond, an organotin compound or an organogermanium compound and a nonaqueous secondary battery having the same.

Nonaqueous electrolytic solution and nonaqueous secondary battery

Non-aqueous electrolytic salt and non-aqueous electrolytic secondary battery in which it is used

A flame-retardant electrolytic solution of an electrolyte salt in an organic solvent, wherein the organic solvent contains at least one phosphorus compound represented by formula (I) and a nonaqueous secondary battery containing the flame-retardant electrolytic solution.

Flame-retardant electrolytic solution and nonaqueous secondary battery containing the same

A process for forming a metal oxide film by means of a chemical vapor deposition system, which comprises using a complex of a .beta.-diketone compound and a group IV metal glycolate, the complex being represented by formula (I): ##STR1## wherein M represents a metal atom of the group IV; R.sup.1 and R.sup.2 each represent a branched alkyl or cycloalkyl group having 4 to 8 carbon atoms; and R.sup.3 represents a straight-chain or branched alkylene group having 2 to 18 carbon atoms.

Process for forming metal oxide film by means of CVD system

Photopolymerizable composition and photopolymerizable element

Acridine compounds such as 1,4-butylenebis-.beta.-(acridin-9-yl)acrylate, or the like, are high in light sensitivity and suitable as a photopolymerization initiator.

Photopolymerizable composition and processes using acridine

Photopolymerizable prepolymer compositions are provided comprising an unsaturated compound having at least one ethylenic double bond that is photopolymerizable to form a polymer, and a photoinitiator having one of the formulae: ##STR1##

Carbazole photoinitiators for the photopolymerization of unsaturated

A substituted acridine derivative represented by ##STR1## wherein R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, R.sub.6, R.sub.7 and R.sub.8 are independently hydrogen atoms, alkyl groups, substituted alkyl groups, aryl groups, substituted aryl groups, halogen atoms, or alkoxy groups, and Z.sub.1 is a six-membered heteroaromatic group which has one or two nitrogen atoms in its ring and may have an alkyl substituent having 1 to 8 carbon atoms, or a quinolyl group; and a photopolymerizable composition comprising 0.01 to 10 parts by weight of said derivative, 100 parts by weight of a photopolymerizable compound having a boiling point of 100.degree. C. or higher at atmospheric pressure and at least one kind of ethylenic unsaturated group, and 0 to 400 parts by weight of a thermoplastic organic polymer.

Substituted acridine derivatives and application thereof

Acridine compounds such as 1,4-butylene-bis-.beta.-(acridin-9-yl)acrylate, or the like are high in light sensitivity and suitable as a photopolymerization initiator.

Acridine compound and photopolymerizable composition using the same

A process is provided for preparing 2,2'-methylene-bis-(4-hydrocarbyl-6-benzotriazolyl-phenols) having formula III: ##STR1## wherein: R is selected from the group consisting of alkyl having from one to about twelve carbon atoms; arylalkyl having from seven to about fourteen carbon atoms and cycloalkyl having from three to about twelve carbon atoms;

Process for preparing

A process for preparing ketocholanate(s) comprises oxidizing cholanic acid compound(s), such as alkyl 3.alpha.-alkoxycarbonyloxy-7.alpha.,12.alpha.- dihydroxycholanates or alkyl 3.alpha.-acyloxy-7.alpha.,12.alpha.-dihydroxycholanates, with an alkali metal salt of an oxo acid of halogen in the presence of a cerium compound. Ketocholanate(s) such as alkyl 3.alpha.-alkoxycarbonyloxy-7,12-dioxocholanataes, alkyl 3.alpha.-alkoxycarbonyloxy- 7-oxo-12.alpha.-hydroxycholanates, alkyl 3.alpha.-acyloxy-7,12-dioxocholanates, alkyl 3.alpha.-alkoxycarbonyloxy-12- oxocholantes, alkyl 3.alpha.-acyloxy-7-oxo-12.alpha.-hydroxycholanates and mixtures thereof are thus produced.

Process for preparing ketocholanates

Polyacetal resin compositions are provided having improved light stability and comprising an alkylidene bis(benzotriazolyl phenol) having the formula: ##STR1## wherein: R.sub.1 is selected from the group consisting of hydrogen and alkyl having from one to about eleven carbon atoms;

Polyacetal resin compositions having improved resistance to

Thermosetting synthetic resin lacquer compositions having improved light stability are provided comprising a thermosetting synthetic resin and an alkylidene bis(benzotriazolyl phenol) having the formula (I): ##STR1## wherein: R.sub.1 is hydrogen or alkyl having from one to about twelve carbon atoms;

Thermosetting synthetic resin lacquer compositions having improved light

Stabilizer compositions for synthetic resins are provided, improving the resistance of the resin to deterioration when exposed to ultraviolet light, comprising a 2,2,6,6-tetramethylpiperidyl compound and an alkylidene-bis-(benzotriazolyl phenol) having the formula: ##STR1## wherein: R.sub.1 is hydrogen or alkyl having from one to about twelve carbon atoms;

Growing community of inventors

Urawa, Japan

Naohiro Kubota