Nikon Corporation

Naohiko Iwata

Masato Takahashi

Yutaka Endo

Hideaki Sakamoto

Ken Hattori

Masaya Iwasaki

Yasuo Araki

Shin-ichi Takagi

The exposure system comprises a projection optical system that irradiates exposure light emitted from a mask onto a substrate, a first support member that supports the projection optical system, and a support structure that supports the first support member, wherein the support member supports the first support member at a position that is higher than the position at which the first support member supports the projection optical system.

Exposure apparatus and device manufacturing method

A scanning type exposure apparatus, which is used to expose a wafer with an image of a pattern on a reticle by synchronously moving the reticle and the wafer, comprises a second gas conditioner for circulating a temperature-controlled gas in a subsidiary chamber which encloses an optical path of an interferometer for measuring a position of a reticle stage. The apparatus comprises a third gas conditioner for supplying a temperature-controlled gas to an internal space of a pedestal including a wafer stage and an optical path of an interferometer for measuring a position of the wafer stage. A positional error of the stage, which would be otherwise caused by temperature-dependent fluctuation of the gas on the optical path of the interferometer, is reduced. A heat insulating material is installed on a top plate of the pedestal so as to intercept heat transfer from a heat source on the pedestal to the internal space of the pedestal. A tube may be arranged in the pedestal so that a temperature of the pedestal is adjusted by allowing a temperature-controlled fluid to flow therethrough.

Exposure apparatus

Growing community of inventors

Kumagaya, Japan

Naohiko Iwata