Empire Technology Development LLC

Merck Patent Gmbh

Az Electronic Materials (luxembourg) S.a.r.l.

Other

Fuji Xerox Co., Ltd.

Ridgefield Acquisition

Naofumi Yoshida

Shuichi Kurabayashi

Kosuke Takano

Toshiaki Nonaka

Katsuto Taniguchi

Megumi Takahashi

Yuji Tashiro

Daishi Yokoyama

Takashi Fuke

Atsuko Noya

Yasuaki Tanaka

Tohru Okabe

Hirohiko Nishiki

Jun Miyazaki

Shogo Murashige

Izumi Ishida

Karsten Koppe

Masanobu Hayashi

Yukiharu Uraoka

Seishi Shibayama

Masahiro Kuzawa

Yasuaki Ishikawa

Toshiakai Nonaka

The present invention relates to novel positive tone photoresist formulations comprising using crosslinkable siloxane polymers. The siloxane polymers used in the positive tone photoresist formulations are crosslinkable and comprise a first repeating unit, which contains at least one maleimide group, and a second repeating unit, which does not contain a maleimide group. The present invention further provides a manufacturing method for a microelectronic structure using a positive tone photoresist formulation according to the present invention and to an electronic device comprising a microelectronic structure, which is obtained or obtainable by said manufacturing method.

Positive tone photoresist formulation using crosslinkable siloxane compounds

To provide a photosensitive siloxane composition capable of forming a pattern having a desired taper angle and a desired linewidth. [Means] The present invention provides a photosensitive siloxane composition comprising: a polysiloxane having a structure represented by the following formula (ia′): (L is an alkylene or phenylene), a photoactive agent, and a solvent.

Photosensitive siloxane composition and pattern forming method using the same

[Problem] To provide a polysiloxanecapable of forming a cured film of a thick film with high heat resistance, a composition comprising the polysiloxane, and a method of manufacturing a cured film using the composition. [Means for Solution] To provide a polysiloxane comprising a repeating unit represented by the following formula (Ib), wherein Ris each independently hydrogen, alkyl, aryl, alkenyl, and the like, a composition comprising the polysiloxane, and a method of manufacturing a cured film using the composition.

Polysiloxane, composition comprising the same and cured film using the same

[Object] To provide a positive type photosensitive composition capable of forming a cured film having high transparency [Means] The present invention provides a positive type photosensitive siloxane composition comprising: a polysiloxane, a diazonaphthoquinone derivative, an additive having a >N—C(═O)— or >N—C(═S)— structure and the capability of interacting with the polysiloxane, and a solvent. The polysiloxane and the additive interact with each other before exposure, but they lose the interaction after exposure.

Positive type photosensitive siloxane composition and cured film formed by using the same

To provide a photosensitive composition capable of easily forming a cured film having a low refractive index. The present invention provides a photosensitive siloxane composition comprising: a polysiloxane, a photosensitive agent, hollow silica particles, and a solvent. The hollow silica particles contain voids inside, and have outer surfaces subjected to hydrophobic treatment.

Photosensitive siloxane composition and cured film formed by using the same

[Problem] To provide a positive type photosensitive polysiloxane composition that can manufacture a cured film having a high surface smoothness, in which generation of wrinkles is suppressed even without adding a curing auxiliary or performing flood exposure. [Means for Solution] A positive type photosensitive polysiloxane composition comprising (I) a polysiloxane, (II) a carboxylic acid compound that is a monocarboxylic acid or a dicarboxylic acid, of 200 to 50,000 ppm based on the total mass of the composition, (III) a diazonaphthoquinone derivative, and (IV) a solvent, and a method for manufacturing a cured film using the composition.

Positive type photosensitive polysiloxane composition

[Object] To provide a positive type photosensitive composition capable of forming a cured film having high transparency [Means] The present invention provides a positive type photosensitive siloxane composition comprising: a polysiloxane, a diazonaphthoquinone derivative, an additive having a quaternary ammonium structure and the capability of interacting with the polysiloxane, and a solvent. The polysiloxane and the additive interact with each other before exposure, but they lose the interaction after exposure.

[Problem] To provide a composition for a black matrix which is a material suitable for manufacturing a black matrix, which is suitable for a high luminance display device structure and has high heat resistance and high light-shielding properties. [Means for Solution] The present invention uses a composition for a black matrix comprising: (I) a black colorant containing carbon black having a volume average particle diameter of 1 to 300 nm; (II) a siloxane polymer to be obtained by hydrolyzing and condensing a silane compound represented by a prescribed formula in the presence of an acidic or basic catalyst; (III) surface modified silica fine particles; (IV) a thermal base generator; and (V) a solvent.

Black matrix composition, black matrix, and black matrix production method

The present invention relates to providing a thin film transistor substrate containing a protective film, which can impart high driving stability. The thin film transistor substrate contains a thin film transistor and a protective film containing a cured product of a siloxane composition which covers the thin film transistor, wherein the thin film transistor has a semiconductor layer made of an oxide semiconductor, and wherein the siloxane composition contains polysiloxane, a fluorine-containing compound, and a solvent.

Thin film transistor substrate provided with protective film and method for producing same

An optical functional film containing a siliceous material, wherein a refractive index nof one surface A of said optical functional film to light is larger than a refractive index nof the other side surface B to light, and the refractive index to light gradually decreases from said surface A to said surface B and wherein when a refractive index of a medium X coming into contact with said surface A is nand a refractive index of a medium Y coming into contact with said surface B is n, the relation n&#x3c;n&#x3c;n&#x3c;nis satisfied and wherein the film is manufactured by the steps of a first layer forming step and a second layer forming step; and a heating step of heating to cure said first layer and said second layer, wherein the contacting parts of said first layer and said second layer are compatibilized.

Optical functional film and method for producing the same

[Object] To provide a composition capable of forming a cured film having low permittivity and excellence in chemical resistance, in heat resistance and in resolution; and further to provide a production process employing the composition. [Means] The present invention provides a composition comprising: an alkali-soluble resin, namely, a polymer comprising a carboxyl-containing polymerization unit and an alkoxysilyl-containing polymerization unit; a polysiloxane; a diazonaphthoquinone derivative; a compound generating acid or base when exposed to heat or light; and a solvent.

Photosensitive siloxane composition

An object of the present invention is to provide a composite of silicon oxide nanoparticles and a silsesquioxane polymer, from which a cured film having a low refractive index can be formed inexpensively. Provided are a method of producing a composite of silicon oxide nanoparticles and a silsesquioxane polymer, the method comprising reacting a silsesquioxane polymer having a silanol group at a terminal or a silane monomer with silicon oxide nanoparticles having a hydroxyl group or an alkoxy group on the surface in a mixed solvent of an aqueous solvent and an organic solvent in the presence of a phase transfer catalyst, and a composite produced by the method.

Composite of silicon oxide nanoparticles and silsesquioxane polymer, method for producing same, and composite material produced using composite thereof

Technologies are generally described for providing a context-based content list for an electronic device. In some examples, a method performed under control of an electronic device may include gathering first information on or from one or more devices nearby the electronic device in response to a content file creation event on the electronic device; gathering second information on or from one or more devices nearby the electronic device in response to a content list creation event on the electronic device; calculating a similarity between the first information and the second information; and generating a content list based at least in part on the similarity between the first information and the second information.

Context-based content list generation

Technologies and implementations for reducing congestion in a network are generally disclosed.

Network congestion reduction

Technologies are generally described for 3D object recognition through 2D image processing based on white balancing and object-rotation in machine vision systems. According to some examples, image recognition of an object captured with a camera under insufficient lighting may be achieved through white balancing. Processing cost reduction may be achieved in the learning process for image recognition through automatic generation of rotated 2D images of target objects to be detected, such as machine parts, from a small number of 2D images of a target object and generation of a 3D image of the target object from the rotated 2D images. Image recognition may thus be ensured even under insufficient lighting through execution of the image recognition process for multiple images and learning the successful recognition results. Some examples may be implemented in mechanical parts selection, where 2D images of the parts may be available beforehand.

Growing community of inventors

Yokohama, Japan

Naofumi Yoshida