Texas Instruments Corporation

Nandu Mahalingam

Lance Stanford Robertson

James David Bernstein

Said Ghneim

Benjamin Moser

The present invention provides a method for implanting ions in a substrate and a method for manufacturing an integrated circuit. The method for implanting ions in a substrate, among other steps, including placing a substrate () on an implant platen () such that a predominant axes () of the substrate () is rotated about 30 degrees to about 60 degrees or about 120 degrees to about 150 degrees offset from a radial with respect to the implant platen (), and further wherein the substrate () is not tilted. The method further includes implanting ions into the substrate (), the rotated position of the predominant axes () reducing shadowing.

Growing community of inventors

Richardson, TX, United States of America

Nandu Mahalingam