Lam Research Corporation

Nancy E Gilbert

Robert D Tas

Artur Kolics

Timothy Joseph Franklin

Jason Stephen Corneille

Ron Rulkens

Steven Douglas Flanders

Shashank Ravindra Kulkarni

Joe Laia

Jason R Wright

Stephen C Jones

An electroless deposition system includes a deposition solution, and saturating the deposition solution with an oxygen concentration in a range from about two thousand parts per million to about twenty thousand parts per million.

Electroless deposition system

Systems having an in-line microwave heater to heat fluids for processing a substrate are provided. An embodiment of a system includes a microelectronic processing chamber, a reservoir for storing a fluid used to process wafers within the chamber, a supply line for transporting the fluid to the chamber, and a microwave heater arranged along the supply line. The system includes processor executable program instructions for operating the microwave heater at parameters configured to heat fluid within the supply line to a temperature greater than a fluid temperature within the reservoir, such as approximately 20&#xb0; C. greater than the reservoir fluid temperature. It is noted that the inclusion of an in-line microwave heater is not limited to microelectronic fabrication systems, but may be used for any system in which heated fluids are used for processing a substrate, such as but not limited to electroplating or electroless plating systems.

Systems incorporating microwave heaters within fluid supply lines of substrate processing chambers and methods for use of such systems

Growing community of inventors

Berkeley, CA, United States of America

Nancy E Gilbert