Toray Industries, Inc.

Nana Takeuchi

Ryoji Okuda

Seiji Fukuda

Shigetaka Kasai

A polishing pad includes at least a cushion layer and a polishing layer including a groove, on a polishing surface, having side surfaces and a bottom surface, wherein at least one of the side surfaces includes a first side surface that extends continuously to the polishing surface and forms an angle &#x3b1; with the polishing surface, and a second side surface that extends continuously to the first side surface and forms an angle &#x3b2; with a plane parallel to the polishing surface, the angle &#x3b1; is larger than 90 degrees, the angle &#x3b2; is not smaller than 85 degrees, and the angle &#x3b2; is smaller than the angle &#x3b1;, a bending point depth is not less than 0.4 mm and not more than 3.0 mm, and the cushion layer has a distortion constant of not less than 7.3&#xd7;10&#x3bc;m/Pa and not more than 4.4&#xd7;10&#x3bc;m/Pa.

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Otsu, Japan

Nana Takeuchi