Lawrence Livermore National Security, LLC

Nan Shen

Jeffrey Devin Bude

Alexander M Rubenchik

Philip Edward Miller

Tayyab Ishaq Suratwala

Gabriel Mark Guss

Michael D Feit

Gabe Guss

Ted Alfred Laurence

William Augustus Steele

Raluca A Negres

Sonny S Ly

Lana Louie Wong

Wesley John Keller

Michael Dennis Feit

The present disclosure relates to a laser system for processing a material. The system may make use of a laser configured to intermittently generate a first laser pulse of a first duration and a first average power, at a spot on a surface of the material being processed, and a second laser pulse having a second duration and a second peak power. The second duration may be shorter than the first duration by a factor of at least 100, and directed at the spot. The second laser pulse is generated after the first laser pulse is generated. The first laser pulse is used to heat the spot on the surface of the material, while the second laser pulse induces a melt motion and material ejection of molten material from the melt pool.

Laser drilling and machining enhancement using gated CW and short pulsed lasers

A method for preventing damage caused by high intensity light sources to optical components includes annealing the optical component for a predetermined period. Another method includes etching the optical component in an etchant including fluoride and bi-fluoride ions. The method also includes ultrasonically agitating the etching solution during the process followed by rinsing of the optical component in a rinse bath.

Methods for globally treating silica optics to reduce optical damage

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Fremont, CA, United States of America

Nan Shen