Cymer, Inc.

Nakgeuon Seong

Robert Jay Rafac

Kevin M O'Brien

Ivan Lalovic

Rostislav Rokitski

Joseph J Bendik

Nigel R Farrar

Ivan B Lalovic

A spectral feature of a pulsed light beam produced by an optical source is estimated by modifying the wavelength of the pulsed light beam based on a predefined repeating pattern having a pattern period including a plurality of steps, the modification including shifting the wavelength of the pulsed light beam by a wavelength offset from a baseline wavelength for each step in the pattern period; measuring the wavelength of the light beam for each step in the pattern period as the wavelength is modified across the pattern; and estimating a spectral feature of the pulsed light beam over an evaluation window that includes all of the steps within the pattern period based at least in part on the measured wavelength of the light beam for each step in the pattern period.

Active spectral control during spectrum synthesis

A method of controlling a spectral property of a light beam includes directing a light beam to a lithography exposure apparatus configured to create a pattern on a wafer; receiving information representative of a spectral property of the light beam; receiving information representative of an optical imaging condition of the lithography exposure apparatus; estimating a characteristic value of the light beam based on the received spectral property information and the received optical imaging condition information; determining whether the estimated light beam characteristic value matches a target light beam characteristic value; and if it is determined that the estimated light beam characteristic value does not match the target light beam characteristic value, adjusting the spectral property of the light beam.

Active spectral control of optical source

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San Diego, CA, United States of America

Nakgeuon Seong