Basf Se Corporation

Nadine Engelhardt

Marco Arnold

Alexander Fluegel

Charlotte Emnet

Marcel Patrik Kienle

Dieter Mayer

Lucas Benjamin Henderson

Sathana Kitayaporn

Verena Strempel

Elisabeth Kuttner

Robert Braendle

Described herein is a composition including copper ions, an acid, and at least one polyaminoamide including, a group of formula L1[A-B-A'-Z][Y—Z]  (L1)whereB is a diacid fragment of formula L2 A, A' are amine fragments independently selected from the group consisting of formula L3a Y is a co-monomer fragment;Z is a coupling fragment of formula L4 n is an integer of from 1 to 400; andm is 0 or an integer of from 1 to 400.

Composition for copper bump electrodeposition comprising a polyaminoamide type leveling agent

Described herein is a composition including metal ions consisting essentially of cobalt ions, and a specific monomeric and polymeric suppressing agent including a carboxylic, sulfonic, sulfinic, phosphonic, or phosphinic acid functional groups which show a suppressing effect that is required for void-free bottom-up filling of nanometer-sized recessed features.

Composition for cobalt plating comprising additive for void-free submicron feature filling

Described herein is an aqueous composition including tin ions and at least one compound of formula I

Composition for tin or tin alloy electroplating comprising suppressing agent

Described herein is an aqueous composition including tin ions and at least one compound of formula I where

A cobalt electrodeposition composition comprising cobalt ions, and particular leveling agents comprising X&#x2014;CO&#x2014;O&#x2014;R, X&#x2014;SO&#x2014;O&#x2014;R, X&#x2014;PO(OR), X&#x2014;SO&#x2014;O&#x2014;Rfunctional groups, wherein Xis a divalent group selected from (i) a chemical bond (ii) aryl, (iii) Cto Calkandiyl, which may be interrupted by O atoms, (iv) an arylalkyl group &#x2014;X&#x2014;X&#x2014;, (v) an alkylaryl group &#x2014;X&#x2014;X&#x2014;, and (vi) &#x2014;(O&#x2014;CHR)O&#x2014;, Ris selected from H and Cto Calkyl. Ris selected from H and Cto Calkyl, Xis a divalent aryl group, Xis a divalent Cto Calkandiyl group.

Composition for cobalt electroplating comprising leveling agent

The present invention provides an aqueous composition comprising tin ions and at least one compound of formula I wherein Xis selected from a linear or branched C-Calkanediyl, which may optionally be interrupted by O or S or a Cto Caromatic moiety, Ris a copolymer of ethylene oxide and a further Cto Calkylene oxide, wherein the content of ethylene oxide is from 5 to 30% by weight, Ris selected from H, R, R, R, R, are (a) independently selected from H, R, R, or (b) may together form a divalent group X; Xis selected from a linear or branched C-Calkanediyl, which may optionally be interrupted by O, S or NR; Ris H or a linear or branched C-Calkyl, Ris selected from H, Rand a linear or branched C-Calkyl. 

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Ludwigshafen, Germany

Nadine Engelhardt