Carl Zeiss Sms Ltd.

Carl Zeiss Smt Gmbh

Camtek Ltd.

Nadav Wertsman

Vladimir Dmitriev

Dirk Beyer

Ofir Sharoni

Aki Shoukrun

Tommy Weiss

Nevo Laron

Thomas Molders

The invention relates to a method for correcting at least one error on wafers processed by at least one photolithographic mask, the method comprises: (a) measuring the at least one error on a wafer at a wafer processing site, and (b) modifying the at least one photolithographic mask by introducing at least one arrangement of local persistent modifications in the at least one photolithographic mask.

Method and apparatus for correcting errors on a wafer processed by a photolithographic mask

A system and method for monitoring a manufacturing process of a fan-out wafer, the method may include acquiring a first set of images of dies after a completion of a first manufacturing stage of a manufacturing process of the fan-out wafer; processing the first set of images to detect defects; performing at least one corrective operation in response to at least one defect detected by processing the first set of images; acquiring a second set of images of dies after a completion of a second manufacturing stage of the manufacturing process of the fan-out wafer, the second manufacturing process follows the first manufacturing process; processing the second set of images to detect defects; and performing at least one corrective operation in response to at least one defect detected by processing the second set of images.

Process control and manufacturing method for fan out wafers

Growing community of inventors

Ein Hod, Israel

Nadav Wertsman