Ebara Corporation

Nabuharu Noji

Mamoru Nakasuji

Masahiro Hatakeyama

Tohru Satake

Shoji Yoshikawa

Kenji Watanabe

Toshifumi Kimba

Takao Kato

Tsutomu Karimata

Hirosi Sobukawa

Muneki Hamashima

Mutsumi Saito

Shin Oowada

The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary electron beams. The cathode includes a plurality of emitters for emitting primary electron beams, arranged apart from one another on a circle centered at an optical axis of a primary electro-optical system. The plurality of emitters are arranged such that when the plurality of emitters are projected onto a straight line parallel with a direction in which the primary electron beams are scanned, resulting points on the straight line are spaced at equal intervals.

Electron beam apparatus and method of manufacturing semiconductor device using the apparatus

Growing community of inventors

Kanagawa, Japan

Nabuharu Noji