Saint-gobain Ceramics & Plastics, Inc.

Fiven Norge As

Nabil Nahas

Doruk Omer Yener

Jennifer H Czerepinski

David F Louapre

Douglas Edwin Ward

Stephen Bottiglieri

Adam J Stevenson

Amin M'Barki

Elodie Bahon

Pierre-Loup Judas

Mark J Hampden-Smith

Stephen D Hartline

Ian T Sines

Nazila Dadvand

Chun-Lung Kuan

Steven L Robare

Vidar Johannessen

Disclosed are methods for forming boron nitride-containing aggregates that exhibit improved wear by attrition, and resulting filled polymers that exhibit significantly improved thermal conductivity. The boron nitride-containing aggregates are prepared according to a method that includes wet granulating boron nitride powder with a granulation solution to form wet boron nitride-containing granules; and drying the wet boron nitride-containing granules to cause evaporation of solvent in the granulation solution, thereby forming boron nitride-containing granules. Sintering achieves the desired boron nitride-containing aggregates.

Process for manufacturing boron nitride agglomerates

A composition can comprise a carrier including a liquid and an abrasive particulate contained in the carrier, the abrasive particulate having, on average, at least 10 wt % cerium oxide in the abrasive particulate and a cerium 3+ ratio (Ce 3+/total cerium) of at least 0.1. In another embodiment, a slurry composition can comprise a liquid carrier comprising water, cerium oxide particles, and free silicate ions, wherein a material removal rate when polishing a silicon oxide wafer can be is increased by at least 3% in comparison to a slurry composition not including free silicate ions.

Composition for conducting material removal operations and method for forming same

A composition including a carrier comprising a liquid, an abrasive particulate contained in the carrier, an accelerant contained in the carrier, the accelerant including at least one free anion selected from the group of iodide (I), bromide (Br), fluoride (F), sulfate (SO), sulfide (S), sulfite (SO), chloride (Cl), silicate (SiO), phosphate (PO), nitrate (NO), carbonate (CO), perchlorate (ClO), or any combination thereof, and a buffer contained in a saturated concentration in the carrier, the buffer including a compound selected from MF, NF, MNF, MI, NI, MNI, MBr, NBr, MNBr, M(SO), N(SO), MaN(SO), MS, NS, MNS, M(SiO), N(SiO), MN(SiO), M(PO), N(PO), MN(PO), M(NO), N(NO), MN(NO), M(CO), N(CO), MN(CO), or any combination, wherein M represents a metal element or metal compound; N represents a non-metal element; and a, b, and x is 1-6.

A surface modified nitride particle including a nitride particle covalently bonded via a urethane moiety to an aromatic compound. The surface modified nitride particle may further include at least two auxiliary moieties for bonding to oligomers.

Modified nitride particles, oligomer functionalized nitride particles, polymer based composites and methods of forming thereof

A method of forming a shaped abrasive particle having a body formed by an additive manufacturing process.

Shaped abrasive particles and methods of forming same

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Boston, MA, United States of America

Nabil Nahas