Laser Systems and Solutions of Europe

Nabil Douri

Fulvio Mazzamuto

Sylvain Perrot

Karim Mikaël Huet

Guillaume Vincent Thebault

Guillermo Abraham Gonzalez Trujillo

Martin Heintzmann

A method for uniformly irradiating a frame of a processed substrate, the processed substrate including a plurality of frames, two consecutive frames being separated by an intermediate zone, the method includes steps of: determining an initial position of the processed substrate using a detecting unit; comparing the detected initial position with a first predetermined position associated with a first frame of the processed substrate; irradiating the first frame of the processed substrate by an irradiation beam emitted by a source unit and scanned by a scanning unit based on the first predetermined position, the irradiation beam being adapted to cover uniformly the whole first frame. A system for uniformly irradiating a frame of a processed substrate is also described.

Method and system for uniformly irradiating a frame of a processed substrate

The present invention relates to a process for irradiating a processed surface () of a processed substrate () so as to obtain a predefined temperature profile, the processed surface () comprising a first area () and a second area (), said first area () having a first combination of optical properties and thermal properties, and said second area () having a second combination of optical properties and thermal properties, said first combination and second combination being different. A further object of the invention is a system () for irradiating a processed surface () of a processed substrate () so as to obtain a predefined temperature profile, the processed surface () comprising a first area () and a second area (), said first area () having a first combination of optical properties and thermal properties, and said second area () having a second combination of optical properties and thermal properties, said first combination and second combination being different.

System and method to minimize irradiation non uniformity

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Gennevilliers, France

Nabil Douri