Samsung Display Co., Ltd.

Myungkyu Kim

Jeongwon Han

Kyunghoon Chung

Kyongho Hong

Sukbeom You

Jinseok Son

Chang-kon Park

Dongjae Lee

A loading apparatus for a deposition mask includes a clamper that clamps the mask extending in a direction, a first adsorption part, a second adsorption part, and a connection part connected to the first adsorption part and the second adsorption part, and includes a picker that transfers the mask. In case that the picker transfers the mask, the first adsorption part adsorbs ends of the mask, the second adsorption unit adsorbs a portion between the ends of the mask, and the clamper clamps the mask between the first adsorption part and the second adsorption part.

Loading apparatus for deposition mask

An apparatus for cleaning a mask includes a chamber in which material deposition is performable on a substrate using the mask, the chamber including a transmission window through which light used in cleaning the mask within the chamber is irradiated into the chamber from outside thereof; within the chamber: a stage on which the substrate is disposed, the stage disposed in a plane defined by first and second directions crossing each other; and a material deposition unit from which a deposition material is provided to the substrate; and a light irradiation unit from which is provided the light used in cleaning the mask within the chamber. The light irradiation unit is disposed outside the chamber and irradiates the light into the chamber through the transmission window. The material deposition unit disposed within the chamber and the light irradiation unit disposed outside the chamber are reciprocally movable in the first direction.

Apparatus for cleaning deposition mask and method of cleaning deposition mask

A mask cleaning apparatus and method of using the same includes a preheating zone preheating a mask, a first ultraviolet cleaning zone irradiating the mask with a first ultraviolet laser beam at a first irradiation angle, a first cooling zone cooling the mask irradiated with the first ultraviolet laser beam, a second ultraviolet cleaning zone irradiating the mask with a second ultraviolet laser beam at a second irradiation angle, a second cooling zone cooling the mask irradiated with the second ultraviolet laser beam, an infrared cleaning zone irradiating the mask with an infrared laser beam at a third irradiation angle, and a peeling zone spraying air onto the mask irradiated with the infrared laser beam.

Mask cleaning method and mask cleaning apparatus for performing the same

A mask tension welding device for welding a mask for thin film deposition on a mask frame, the mask tension welding device including a tension unit to pull the mask in one direction; a pressurizing unit to press the mask to the mask frame, the pressuring unit including an upper housing, a lower housing coupled to the upper housing, a window between the upper housing and the lower housing, a space in the lower housing into which a fluid is injectable, and an inlet and an outlet to provide a passage through which the fluid is injected and discharged; and a laser welding unit to weld the mask and the mask frame to each other.

Mask tension welding device for thin film deposition

Exemplary embodiments provide an apparatus to manufacture a mask frame assembly, including: extending unit configured to extend both ends of a mask in a first direction and arrange the mask on a frame, the mask including a deposition pattern and the frame including an opening; a pressurizing unit including a plurality of pressing portions the plurality of pressing portions configured to independently press the mask toward the frame; and a welding unit configured to weld the mask to affix the mask onto the frame.

Growing community of inventors

Cheonan-si, South Korea

Myungkyu Kim