Growing community of inventors

Chungcheongnam-do, South Korea

Myung-Yeol Kim

Average Co-Inventor Count = 5.64

ph-index = 1

The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.

Forward Citations = 1

Myung-Yeol KimJung-June Lee (2 patents)Myung-Yeol KimEui Hyun Ryu (2 patents)Myung-Yeol KimWoo-Hyung Lee (2 patents)Myung-Yeol KimEmad Aqad (1 patent)Myung-Yeol KimJae Hwan Sim (1 patent)Myung-Yeol KimJae-Bong Lim (1 patent)Myung-Yeol KimEui-Hyun Ryu (1 patent)Myung-Yeol KimHyun Bae Jeon (1 patent)Myung-Yeol KimMin Kyung Jang (1 patent)Myung-Yeol KimJae-Yun Ahn (1 patent)Myung-Yeol KimEunHye Cho (1 patent)Myung-Yeol KimJung Woo Kim (1 patent)Myung-Yeol KimJae-Hwan Sim (1 patent)Myung-Yeol KimKwang-Hwyi Im (1 patent)Myung-Yeol KimKwang-Mo Choi (1 patent)Myung-Yeol KimHaemi Jeong (1 patent)Myung-Yeol KimMyung-Yeol Kim (4 patents)Jung-June LeeJung-June Lee (11 patents)Eui Hyun RyuEui Hyun Ryu (6 patents)Woo-Hyung LeeWoo-Hyung Lee (2 patents)Emad AqadEmad Aqad (46 patents)Jae Hwan SimJae Hwan Sim (11 patents)Jae-Bong LimJae-Bong Lim (10 patents)Eui-Hyun RyuEui-Hyun Ryu (7 patents)Hyun Bae JeonHyun Bae Jeon (7 patents)Min Kyung JangMin Kyung Jang (3 patents)Jae-Yun AhnJae-Yun Ahn (2 patents)EunHye ChoEunHye Cho (2 patents)Jung Woo KimJung Woo Kim (2 patents)Jae-Hwan SimJae-Hwan Sim (2 patents)Kwang-Hwyi ImKwang-Hwyi Im (1 patent)Kwang-Mo ChoiKwang-Mo Choi (1 patent)Haemi JeongHaemi Jeong (1 patent)
..
Inventor’s number of patents
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Strength of working relationships

Company Filing History:

1. Rohm and Haas Electronic Materials Korea Ltd. (4 from 146 patents)

2. Rohm & Haas Electronic Materials LLC (1 from 696 patents)


4 patents:

1. 11487203 - Monomers, polymers and photoresist compositions

2. 11480878 - Monomers, polymers and photoresist compositions

3. 11269252 - Method for forming pattern using antireflective coating composition including photoacid generator

4. 10203602 - Coating compositions for use with an overcoated photoresist

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as of
12/5/2025
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