Samsung Electronics Co., Ltd.

Myung-Sun Kim

Jae-heung Lee

Sung-hyu Han

Sun-nam Lee

Dong-Suk Shin

Young-sun Yoon

Bong-seon Kim

Hoi-Sung Chung

Su-hyun Nam

Dong-Hyuk Kim

Yong-jin Jang

Nae-in Lee

Pan-Kwi Park

Jae-Hong Kim

Ho Young Lee

Yang-lim Choi

Hye-Jung Cho

Hwa-Sung Rhee

Ji-Hye Yi

Young-ho Kim

Kyoung-mi Kim

Jae-Hun Lee

Young-Ho Kim

Jae-Ho Kim

Jae-ho Kim

Yong-kuk You

Tetsuji Ueno

Soo-Kyung Kim

Yong-Joo Lee

Chang-Ho Lee

Seok Lee

Jae-Woo Seo

Seok Min Han

Kwang-Min Lee

Ju-hee Seo

Boo-deuk Kim

Ju Hwan Jung

Hyo-Jin Yun

Mi-Hwa Park

Jong-Hun Lee

Seong-Jin Nam

Tae-Ho Hwang

Ayush Jain

Sang-su Choi

Hak-soo Ju

Ji-young Moon

Junetaeg Lee

Rakie Kim

Hyoung Soo Ko

Youn-Kyung Wang

Jin-A Ryu

Jung-Hee Cheon

Jung-Yon Cho

Moon-young Choi

Mi-Ran Kim

Won Joo Kim

Jung-Shik Heo

Kyoung-Min Kim

Jae-Heung Lee

Se-kyung Baek

Hakyu Choi

Doo Cheol Park

Seung Hyuk Chang

Mi-Ra Park

Si-Hoon Song

Sungkwan Kim

Jung-kuk Park

Jaesung Yun

Ji-Yun Ham

Su-Hyun Nam

Yong-Jin Jang

Jae-Un Park

Yang-Lim 112-2403 Sunkyung Apt Choi

Yong-Kuk You

Sung-Hyu Han

Bong-Seon 903-411 Jugong 9-Danji Apt Kim

Young-Sun Yoon

A method performed by a managing server includes: receiving, from an electronic device, operation data of the electronic device; identifying, by using artificial intelligence (AI), a device usage pattern of the electronic device; identifying, by using the AI, information related to a failure or an abnormal operation of the electronic device and a solution to the failure or the abnormal operation based on the device usage pattern and the operation data received from the electronic device; and transmitting, to a user terminal, the information related to the failure or the abnormal operation of the electronic device and the solution to the failure or the abnormal operation.

Method and apparatus for managing operation data of appliance for failure prediction

A method performed by an appliance includes receiving, from a managing server, information about a data pattern detection routine to detect abnormal data among operation data of the appliance, determining whether the operation data of the appliance matches a normal data pattern defined by the data pattern detection routine, determining the operation data as the abnormal data when the operation data does not match the normal data pattern, and transmitting the abnormal data to the managing server.

A method for managing data by an electronic device is provided. The method includes receiving first data inputted from a user, generating second data by encrypting the first data using a public key, generating a query comprising the second data, transmitting the query to a server, receiving third data corresponding to the query from the server, generating fourth data by decrypting the third data using a secret key corresponding to the public key, and outputting the fourth data.

Method and system for communicating homomorphically encrypted data

A method and an apparatus for performing task scheduling in a terminal are provided. The terminal includes at least two different types of cores and determines if a change in a task state has occurred in response to at least one of the two cores, If a change in a task state has occurred, the terminal determines, for said at least one core, the variation in the duration of each of a plurality of tasks being executed, predicts the duration of each of the plurality of tasks on the basis of the change in the task state using the determined variation, and performs task scheduling for said at least one core in accordance with the predicted duration.

Method and apparatus for performing task scheduling in terminal

In a semiconductor device, a first active region has a first &#x3a3;-shape, and the second active region has a second &#x3a3;-shape. When a line that is perpendicular to the substrate and passes a side surface of a first gate electrode in the first region is defined as a first vertical line, when a line that is perpendicular to the substrate and passes a side surface of a second gate electrode in the second region is defined as a second vertical line, when a shortest distance between the first vertical line and the first trench is defined as a first horizontal distance, and when a shortest distance between the second vertical line and the second trench is defined as a second horizontal distance, a difference between the first horizontal distance and the second horizontal distance is equal to or less than 1 nm.

Semiconductor device having embedded strain-inducing pattern and method of forming the same

A method of fabricating an image sensor is provided. The method may include preparing a substrate with first to third pixel regions, coating a first color filter layer on the substrate, sequentially forming a first sacrificial layer and a first protection layer to cover the first color filter layer, forming a first photoresist pattern on the first protection layer to be overlapped with the first pixel region, performing a first dry etching process using the first photoresist pattern as an etch mask to the first sacrificial layer and the first protection layer to form a first color filter, a first sacrificial pattern, and a first protection pattern sequentially stacked on the first pixel region, and selectively removing the first sacrificial pattern to separate the first protection pattern from the first color filter.

Image sensor and fabricating method thereof

A method of fabricating a microlens includes forming layer of photoresist on a substrate, patterning the layer of photoresist, and then reflowing the photoresist pattern. The layer of photoresist is formed by coating the substrate with liquid photoresist whose viscosity is 150 to 250 cp. A depth sensor includes a substrate and photoelectric conversion elements at an upper portion of the substrate, a metal wiring section disposed on the substrate, an array of the microlenses for focusing incident light as beams onto the photoelectric conversion elements and which beams avoid the wirings of the metal wiring section. The depths sensor also includes a layer presenting a flat upper surface on which the microlenses are formed. The layer may be a dedicated planarization layer or an IR filter, interposed between the microlenses and the metal wiring section.

Method of fabricating microlens, and depth sensor including microlens

A method of and apparatus for encrypting and/or decrypting content according to broadcast encryption scheme. The decryption method includes: determining whether or not a revoked device among devices that have licenses for predetermined content is present; and according to the determination result, selectively decrypting a content key encrypted by using a key to prevent the revoked device from decrypting the predetermined content. By doing so, an unnecessary encryption process and decryption process that occur when there is no revoked device are avoided.

Method and apparatus for efficiently encrypting/decrypting digital content according to broadcast encryption scheme

A key management, user registration and deregistration for a digital rights management (DRM) system in a home network, using a hierarchical node topology. In the key management, node information is generated by allocating a pair of keys (a public key and a private key) to each node. A node tree is made by generating link information using the pair of keys and a content key. The link information is delivered from an upper node to a lower node using the node tree. The link information is obtained by encrypting a private key of a 'TO' node using a public key of a 'FROM' node. Accordingly, it is possible to realize a DRM system that protects content and easily accomplishes a binding mechanism and a revocation mechanism.

Key management method using hierarchical node topology, and method of registering and deregistering user using the same

A photoresist composition for fabricating a probe array is provided. The photoresist composition includes a photoacid generator having an onium salt and an i-line reactive sensitizer.

Photoresist composition for fabricating probe array, method of fabricating probe array using the photoresist composition, composition for photosensitive type developed bottom anti-reflective coating, fabricating method of patterns using the same and fabricating method of semiconductor device using the same

Provided are methods of forming semiconductor devices. A method may include preparing a semiconductor substrate including a first region and a second region adjacent the first region. The method may also include forming sacrificial pattern covering the second region and exposing the first region. The method may further include forming a capping layer including a faceted sidewall on the first region using selective epitaxial growth (SEG). The faceted sidewall may be separate from the sacrificial pattern. The sacrificial pattern may be removed. Impurity ions may be implanted into the semiconductor substrate.

Methods of forming semiconductor devices having faceted semiconductor patterns

Growing community of inventors

Uiwang-si, South Korea

Myung-Sun Kim