Samsung Electronics Co., Ltd.

Myung Soo Noh

Seok Yun Jeong

No Young Chung

Jeong-Lim Kim

Young Han Kim

Se Jin Park

Ju Yun Park

A semiconductor device comprising first and second unit cells, the first unit cell comprising a first fin pattern extending in a first direction, a first gate pattern extending in a second direction, and a first contact disposed on a side of the first gate pattern contacting the first fin pattern, the second unit cell comprising a second fin pattern extending in the first direction, a second gate pattern extending in the second direction, and a second contact disposed on a side of the second gate pattern contacting the second fin pattern, wherein the first and second gate patterns are spaced apart and lie on a first straight line extending in the second direction, the first and second contacts are spaced apart and lie on a second straight line extending in the second direction, and a first middle contact is disposed on and connects the first and second contacts.

Semiconductor device and layout design method

Semiconductor device having improved margins

A method includes performing OPC on a first mask design having a plurality of patterns having line widths; measuring a number of each of the line widths within the first mask design on which the OPC was performed; obtaining a probability distribution of each of the line widths within the first mask design on which the OPC was performed; obtaining a distribution of each of the line widths by multiplying the number of each of the line widths by the probability distribution; obtaining a line width distribution of the first mask design by summing the distribution of each of the line widths; comparing a probability distribution within a first critical line width in the line width distribution with a first critical probability; and performing the OPC on the first mask design again if the probability distribution within the first critical line width is greater than the first critical probability.

Semiconductor device and method of fabricating the same

Growing community of inventors

Suwon-si, South Korea

Myung Soo Noh