Lg Chemical Ltd.

Lucky Limited

Myung-Man Kim

Sang-Young Lee

Yeong-Rae Chang

Heon-Sik Song

Jin-Nyoung Yoo

Byeong-In Ahn

Jong-Kee Yeo

Dong-Ok Kim

The present invention relates to a method for reforming the surface of polymer, especially to a method for providing hydrophilicity or increasing hydrophobicity by reforming the surface of polymer or polymer membrane. The present invention is a method for reforming the surface of polymer membrane by irradiating it with energized ionic particles under the vacuum condition. The method including the steps of: a) manufacturing polymer membrane, including a surface activated, by inserting polymer membrane into a vacuum chamber, and by irradiating energized ionic particles on the surface of polymer membrane with an ion beam under a high vacuum; and b) manufacturing polymer membrane treated with a reactive gas on the surface of membrane, including the activated surface of step a), by infusing the reactive gas into a vacuum chamber after energized ionic particles of step a) have been irradiated. The methods in the present invention can achieve their objects to reform the surface to provide hydrophilicity of hydrophobicity without deteriorating mechanical properties of the polymer membrane. Additionally, it can also contribute to an improved working environment and readily accommodate mass production techniques because the surface reforming of polymer membrane is a relatively simple technique that does not employ solvents.

Methods for reforming polymer surface for improved wettability

A method of producing a microporous membrane comprising the steps of: extruding a polymer at a temperature of from (polymer melting point &plus;10&deg; C.) to (polymer melting point &plus;100&deg; C.); drawing the extruded polymer at a rate of 5&tilde;120 m/min in 10&tilde;150&deg; C. to obtain a polymer film; annealing the polymer film at a temperature of from (polymer melting point &minus;100&deg; C.) to (polymer melting point &minus;5&deg; C.) for 10 seconds to 1 hour; irradiating both surfaces of the annealed polymer film with an ion-particle amount of 10 &tilde;10 ion/cm energized at 10 &tilde;10 KeV, at an irradiating distance of 5&tilde;100 cm under a vacuum of 10 &tilde;10 torr; cold stretching the irradiated polymer film at a temperature of from &minus;20&deg; C. to (polymer melting point &minus;40&deg; C.); hot stretching the cold stretched polymer film at a temperature of from (polymer melting point &minus;40&deg; C.) to (polymer melting point &minus;5&deg; C.); and heat setting the hot stretched polymer film at a temperature of from (polymer melting point &minus;80&deg; C.) to (polymer melting point &minus;5&deg; C.).

Microporous membrane and method for providing the same

Process for preparing deodorized resin for dry toner

Polymeric gloss modifiers, are prepared by forming polymer latices of a core/shell structure or a multi-layered structure, and coagulating and interparticle crosslinking the polymer latices. Said modifiers are used in preparing a low gloss thermoplastic resin compound.

Processes for preparing polymeric gloss modifiers and thermoplastic

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Daejeon, South Korea

Myung-Man Kim