Daewoo Electronics Co., Ltd.

Myung-Kwon Koo

Jae-Hyuk Chung

Min-Sik Um

Yong-Ki Min

Joon-Mo Nam

Myung-Hyun Park

An inventive array of M.times.N thin film actuated mirrors includes an active matrix, a passivation layer, an etchant stopping layer, and an array of M.times.N actuating structures. Each of the active matrix includes a substrate, an array of M.times.N MOS transistors, M number of source lines, N number of gate lines, an array of M.times.N connecting terminals and an array of M.times.N levelling members, top of the levelling member being at a same level as that of the connecting terminal. Each of the actuating structures includes a first thin film electrode, an thin film electrodisplacive layer, an elastic layer and a conduit, and has a proximal end and a distal end, the proximal end being divided into a first and a second side portions, wherein the first side portion of the proximal end is located on top of the connecting terminal in the active matrix and the second side portion of the proximal end is located on top of the levelling member in the active matrix.

Array of thin film actuated mirrors having a levelling member

An inventive method for the manufacture of an array of M.times.N thin film actuated mirrors for use in an optical projection system includes the steps of: providing an active matrix; depositing a thin film sacrificial layer; depositing a protective oxidation layer on top of the thin film sacrificial layer; creating an array of empty cavities; depositing an elastic layer; forming an array of conduits in the elastic layer; depositing a second thin film, a thin film electrodisplacive and a first thin film layers, successively, thereby forming a multiple layer structure; patterning the multiple layer structure, until the thin film sacrificial layer is exposed; and removing the thin film sacrificial layer to thereby form an array of M.times.N thin film actuated mirrors. The protective oxidation layer is deposited on top of the thin film sacrificial layer before the formation of each of the empty cavities, which, in turn, prevents phosphorus on the surface of thin film sacrificial layer from getting oxidized.

Method for the manufacture of a thin film actuated mirror array

A method for manufacturing an array of M.times.N thin film actuated mirrors includes the steps of: providing an active matrix; forming a thin film sacrificial layer; creating an array of empty slots with sharp edges in the thin film sacrificial layer; rounding off the sharp edges; forming supporting members; depositing an elastic layer; forming conduits; forming a second thin film layer; depositing a thin film electrodisplacive layer; patterning the thin film electrodisplacive and the second thin film layers into an array of thin film electrodisplacive members and second thin film electrodes; depositing an insulating layer; patterning the insulating and the elastic layers into an array of insulating and elastic members; removing the thin film sacrificial layer, thereby providing driving spaces; forming a photoresist layer, the photoresist also filling the driving spaces; removing the photoresist layer and the insulating members formed on top of each of the thin film electrodisplacive members; and forming a first thin film electrode on top of each of the thin film electrodisplacive members thereby forming the array of M.times.N thin film actuated mirrors.

Method for manufacturing an array of thin film actuated mirrors

A method for forming an elastic member in a thin film actuated mirror, the method being capable of controlling a stress built up therein, is disclosed. The method includes the steps of: forming a thin film sacrificial layer; depositing an elastic layer on top of the thin film sacrificial layer by using a CVD method; forming an actuating structure on top of the elastic layer, the actuating structure having a first thin film electrode, a thin film electrodisplacive member, a second thin film electrode and an elastic member; and removing the thin film sacrificial layer. In the present invention, the elastic layer is vertically divided into at least two portions, each of the portions being made of a same material having a different stoichiometry. The stress built up in the elastic layer is controlled by controlling the ratio of the source gases.

Method for manufacturing a thin film actuated mirror having a stable

An inventive method for the manufacture of an array of M.times.N thin film actuated mirrors for use in an optical projection system includes the steps of: providing an active matrix; depositing a thin film sacrificial layer; creating an array of empty cavities in the thin film sacrificial layer; depositing an elastic layer; forming an array of conduits in the elastic layer; depositing a second thin film, a thin film electrodisplacive and a first thin film layers, successively; patterning the first thin film, the thin film electrodisplacive, the second thin film and the elastic layers, thereby forming an array of actuated mirror structures; forming a thin film protection layer completely covering each of the actuated mirror structures; removing the thin film sacrificial layer by using an etchant; rinsing away the etchant by using a rinse; removing the rinse by drying in a vacuum or by using a spin drying method; and removing the thin film protection layer, thereby forming the array of M.times.N thin film actuated mirrors.

Growing community of inventors

Seoul, South Korea

Myung-Kwon Koo