Enf Technology Co., Ltd.

Olive Union, Inc.

Samsung Electronics Co., Ltd.

Seoul National University

Oliver Union, Inc.

Myung Geun Song

Myung Ho Lee

Hyeon Woo Park

Jin Sung Kim

Tae Ho Kim

Gi Young Kim

Jeong Sik Oh

Jungkun Choi

Jong Min Baek

Byung Hee Kim

Woo Kyung You

Sang Hoon Ahn

Jang Woo Cho

Du Won Lee

Na Ein Lee

Sung Jun Hong

Hoon Sik Kim

Jae Jung Ko

Myong Euy Lee

Jun Hyeok Hwang

Byung Kwon Cho

Dong Hyun Lee

Hyun Seok Seo

Boun Yoon

Hak Soo Kim

Hayoung Jeon

Jeongnam Han

Ki-Hyung Ko

Sang Yeon Kim

Jae Woong Choi

Myung Joo Kang

Myoung Su Cho

Yoon Soo Kim

Seok Hyeon Nam

Na Rae Yim

Jun Her

Byeong Eon Lee

Hyun Jin Jung

Young Jin Koh

Dong Jun Woo

Geon Woo Kim

Sang Dae Lee

Hye Hee Lee

Provided is an etchant composition for a silicon layer including: a fluoride-based compound; a nitrate-based compound; an acid mixture including a phosphoric acid-based inorganic acid and an organic acid; and a nitrosyl compound and capable of selectively etching the silicon layer with respect to a silicon oxide layer.

Etchant composition for silicon layer and etching method using the same

A hearing device directly or indirectly connected to a server through a network, the hearing device being provided with: an input unit that acquires sound data from the outside; a communication unit that transmits the sound data to the server, and receives a parameter set generated on the basis of the analysis result obtained by analyzing the sound data in the server; a storage unit that stores the parameter set; and an adjustment unit that, on the basis of the parameter set, adjusts gains of a plurality of prescribed frequencies.

Hearing device, and method for adjusting hearing device

Silicon etching compositions are described and may be used for selectively etching silicon with respect to a silicon insulating film. In particular, the silicon etching compositions can be used to improve the selective etching ratio of silicon from the surface of a semiconductor on which a silicone oxide film and silicon are exposed.

Etching composition

The present disclosure provides an etching composition for a metal nitride layer and an etching method of a metal nitride layer using the same, and more particularly, to an etching composition for a metal nitride layer selectively etching the metal nitride layer, an etching method of a metal nitride layer using the etching composition, and a method of manufacturing a microelectronic device, the method including an etching process performed using the etching composition.

Etching composition for metal nitride layer and etching method using the same

Provided are a silicon nitride film etching composition, a method of etching a silicon nitride film using the same, and a manufacturing method of a semiconductor device. Specifically, a silicon nitride film may be highly selectively etched as compared with a silicon oxide film, and when the composition is applied to an etching process at a high temperature and a semiconductor manufacturing process, not only no precipitate occurs but also anomalous growth in which the thickness of the silicon oxide film is rather increased does not occur, thereby minimizing defects and reliability reduction.

Silicon nitride film etching composition and etching method using the same

Provided are a silicon nitride film etching composition, a method of etching a silicon nitride film using the same, and a manufacturing method of a semiconductor device. Specifically, a silicon nitride film may be stably etched with a high selection ratio relative to a silicon oxide film, and when the composition is applied to an etching process at a high temperature and a semiconductor manufacturing process, not only no precipitate occurs but also anomalous growth in which the thickness of the silicon oxide film is rather increased does not occur, thereby minimizing defects and reliability reduction.

A cleaning composition for removing post-etch or post-ash residues from a semiconductor substrate, and a cleaning method using the same are disclosed. The cleaning composition can comprise water; a fluorine compound; an alkanolamine compound; and a corrosion inhibitor. The corrosion inhibitor is a mixture of a first corrosion inhibitor and a second corrosion inhibitor. When using the cleaning composition, it is possible to efficiently remove the residues of various aspects existing on a surface of the substrate or the semiconductor device without damage to a substrate or a semiconductor device including various metal layers, insulating layers, etc. Accordingly, when a highly integrated and miniaturized semiconductor device is manufactured, it may be advantageously applied to the removal of residues generated on the surface of the substrate or the semiconductor device.

Cleaning composition and cleaning method using the same

Disclosed is a digital hearing device with a microphone in an ear band, the digital hearing device including a body; an ear band configured to extend from one side of the body and to surround at least a portion of auricle of a user; a plurality of microphones provided to the ear band at predetermined intervals; an ear head configured to protrude inward from the body and to fit into an ear of the user; and a speaker provided to the ear head and configured to amplify sound received from the plurality of microphones and to deliver the amplified sound to the user.

Digital hearing device with microphone in ear band

Earphone

Earphone case

The inventive concept relates to a smart hearing device for providing a control parameter and feedback for a natural language or a non-natural language determined by analyzing sound data, which includes a receiving unit that receives sound data of a voice signal and a noise signal from a first microphone and a second microphone being formed at one side, a determination unit that compares digital flow of the sound data with a previously stored graph pattern to determine a natural language or a non-natural language for the sound data, a processing unit that matches similar data for the determined natural language or non-natural language, based on a database including a natural language area and a non-natural language area, and a providing unit that provides a user with a one-sided sound converted by setting a control parameter in a natural language or a non-natural language specified according to the matched similar data.

Smart hearing device for distinguishing natural language or non-natural language, artificial intelligence hearing system, and method thereof

A user is allowed to three-dimensionally recognize environment change and noise change corresponding to the sound directionality of the left and right sides through a control parameter that is set by analyzing an audio signal received from a first smart hearing device formed on one side and a second smart hearing device formed on an opposite side.

Adaptive solid hearing system according to environment change and noise change

A thinner composition is capable of reducing the amount of photoresist used in a reducing resist consumption (RRC) coating process, an edge bead removed (EBR) process or the like, and removing unnecessary photoresist on an edge portion or a backside portion of the wafer. The thinner composition includes C-Calkyl C-Calkoxy propionate, propylene glycol C-Calkyl ether, and propylene glycol C-Calkyl ether acetate.

Thinner composition

Provided is a silicon nitride layer etching composition, and more specifically, a silicon nitride layer etching composition including two different silicon-based compounds in an etching composition to be capable of selectively etching a silicon nitride layer relative to a silicon oxide layer with a remarkable etch selectivity ratio and providing remarkable effects of suppressing generation of precipitates and reducing the abnormal growth of other layers existing in the vicinity, including the silicon oxide layer when the silicon nitride layer etching composition is used for an etching process and a semiconductor manufacturing process.

Silicon nitride layer etching composition

Growing community of inventors

Yongin-si, South Korea

Myung Geun Song