Xilinx, Inc.

Cypress Semiconductor Corporation

Cornell Research Foundation Inc.

Myongseob Kim

Henley Liu

Cheang-Whang Chang

Jaspreet Singh Gandhi

Nui Chong

Cheang Whang Chang

Gamal Refai-Ahmed

Suresh Ramalingam

Mohsen Hossein Mardi

Boon Yong Ang

Cinti Xiaohua Chen

Suresh Parameswaran

Xiao-Yu Li

Ping-Chin Yeh

Tien-Yu Lee

Yuqing Gong

Arifur Rahman

Amitava Majumdar

Edwin Chihchuan Kan

Zhiyuan Wu

Ivor G Barber

Jae-Gyung Ahn

John W Cooksey

Yun Wu

Dong P Kim

Sanjiv Stokes

Albert Shih-Huai Lin

Sethuraman Lakshminarayanan

Hui-Wen Lin

Ferdinand F Fernandez

Chungho Lee

Nick Yu-Min Shen

Suresh P Parameswaran

Some examples described herein relate to protecting an integrated circuit (IC) structure from imaging or access. In an example, an IC structure includes a semiconductor substrate, an electromagnetic radiation blocking layer, and a support substrate. The semiconductor substrate has a circuit disposed on a front side of the semiconductor substrate. The electromagnetic radiation blocking layer is disposed on a backside of the semiconductor substrate opposite from the front side of the semiconductor substrate. The support substrate is bonded to the semiconductor substrate. The electromagnetic radiation blocking layer is disposed between the semiconductor substrate and the support substrate.

Integrated circuit (IC) structure protection scheme

An integrated circuit (IC) device is disclosed which includes at least a first hybrid bond interface layer disposed between adjacent wafers of a wafer stack. Routing within the hybrid bond interface layer allows test pads exposed on a top wafer of the wafer stack to electrically couple test keys within the wafer stack. By utilizing the routing within the hybrid bond interface layer to index electrical connections between adjacent wafers, IC dies stacked on the wafers may be fabricated with less mask sets as compared to conventional designs.

Interwafer connection structure for coupling wafers in a wafer stack

A chip package assembly and method for fabricating the same are provided which utilize a plurality of extra-die heat transfer posts for improved thermal management. In one example, a chip package assembly is provided that includes a first integrated circuit (IC) die mounted to a substrate, a cover disposed over the first IC die, and a plurality of extra-die conductive posts disposed between the cover and substrate. The extra-die conductive posts provide a heat transfer path between the cover and substrate that is laterally outward of the first IC die.

Stacked silicon package assembly having thermal management

An integrated circuit device and techniques for manufacturing the same are described therein. The integrated circuit device leverages two or more pairs of stacked integrated circuit dies that are fabricated in mirror images to reduce the complexity of manufacturing, thus reducing cost. In one example, an integrated circuit device is provided that includes an integrated circuit (IC) die stack. The IC die stack includes first, second, third and fourth IC dies. The first and second IC dies are coupled by their active sides and include arrangements of integrated circuitry that are mirror images of each other. The third and fourth IC dies are also coupled by their active sides and include arrangements of integrated circuitry that are mirror images of each other.

Integrated circuit device with stacked dies having mirrored circuitry

Integrated circuit (IC) dies and method for manufacturing the same are described herein that mitigate pattern loading effects during manufacture. In one example, the IC includes a die body having a first circuit block separated from an adjacent second circuit block by a buffer zone. The first and second circuit blocks have first and second transistors that are at least partially fabricated from a gate metal layer and disposed immediately adjacent the buffer zone. A dummy structure is formed in the buffer zone and is also at least partially fabricated from the gate metal layer. An amount of gate metal layer material in the dummy structure is selected to mitigate differences in the amount of gate metal layer material in regions of first and second circuit blocks that neighbor each other across the buffer zone.

IC die with dummy structures

Examples described herein provide techniques for multi-die device structures having improved gap uniformity between neighboring dies. In some examples, a first die and a second die are attached to an interposer. A first gap is defined by and between the first die and the second die. At least one of the first die or the second die is etched at the first gap. The etching defines a second gap defined by and between the first die and the second die. The first die, the second die, and the interposer are encapsulated with an encapsulant. The encapsulant is disposed in the second gap.

Multi-die device structures and methods

Device(s) and method(s) related generally to a wafer or die stack are disclosed. In one such device, a die stack of two or more integrated circuit dies has associated therewith test circuits corresponding to each level of the die stack each with a set of pads. A test data-input path includes being from: a test data-in pad through a test circuit to a test data-out pad of each of the test circuits; and the test data-out pad to the test data-in pad between consecutive levels of the test circuits. Each of the set of pads includes the test data-in pad and the test data-out pad respectively thereof. A test data-output path is coupled to the test data-out pad of a level of the levels.

Test circuits for testing a die stack

An electronic device and method for fabricating the same are disclosed herein. In one example the electronic device includes a substrate, a first die stack, and a second die stack. The first die stack includes a first functional die and a first dummy die. The first functional die is mounted to the substrate. The second stack includes a plurality of serially stacked second functional dies mounted to the substrate. The first dummy die is stacked on the first functional die. The first dummy die has a top surface that is substantially coplanar with a top surface of the second die stack. In one particular example, the first die stack includes a logic die and the second die stack includes a plurality of serially stacked memory dies.

Package integration for memory devices

A chip package assembly and method for fabricating the same are provided which utilize at least one modular core dice to reduce the cost of manufacture. The modular core dice include at least two die disposed on a wafer segment that are separated by a scribe lane. In one example, a chip package assembly is provided that includes an interconnect substrate stacked below a first wafer segment. The first wafer segment has a first die spaced from a second die by a first scribe lane. The interconnect substrate has conductive routing that is electrically connected to the first die and the second die through die connections.

Chip package assembly with modular core dice

Methods and apparatus are described for heat management in an integrated circuit (IC) package using a lid with recessed areas in the inner surfaces of the lid. The recessed areas (e.g., trenches) provide receptacles for accepting a portion of a thermal interface material (TIM) that may be forced out when the lid is positioned on the TIM above one or more integrated circuit (IC) dies during fabrication of the IC package. In this manner, the TIM bond line thickness (BLT) between the lid and the IC die(s) may be reduced for decreased thermal resistance, but sufficient interfacial adhesion is provided for the IC package with such a lid to avoid TIM delamination.

Methods and apparatus for thermal interface material (TIM) bond line thickness (BLT) reduction and TIM adhesion enhancement for efficient thermal management

A stacked wafer assembly and method for fabricating the same are described herein. In one example, a stacked wafer assembly includes a first wafer bonded to a second wafer. The first wafer includes a plurality of fully functional dies and a first partial die formed thereon. The second wafer includes a plurality of fully functional dies and a first partial die formed thereon. Bond pads formed over an inductor of the first partial die of the first wafer are bonded to bond pads formed on the first partial die of the second wafer to establish electrical connection therebetween.

Wafer edge partial die engineered for stacked die yield

A circuit for testing bond connections between a first die and a second die is described. The circuit comprises a defect monitoring circuit implemented on the first die, which is configured as a test die; and a plurality of bond connections between the first die and the second die; wherein the defect monitoring circuit is configured to detect a defect in a bond connection of the plurality of bond connections between the first die and the second die. A method of testing bond connections between a first die and a second die is also described.

Circuit for and method of testing bond connections between a first die and a second die

An integrated circuit includes a die having a conductive layer. The conductive layer includes a data wire, a first power supply wire of a first voltage potential, and a second power supply wire of a second voltage potential different from the first voltage potential. A segment of the data wire is located between, and substantially parallel to, a segment of the first power supply wire and a segment of the second power supply wire. Further, the first power supply wire is coupled to a first probe structure; and, the second power supply wire is coupled to a second probe structure.

Shielded wire arrangement for die testing

An apparatus for a stacked silicon interconnect technology (SSIT) product comprises an interposer die, a plurality of integrated circuit dies, a plurality of active components forming an active connection between the integrated circuit dies and the interposer die, and a plurality of dummy components at the interposer die, the dummy components not forming an active connection between the integrated circuit dies and the interposer die. At least a subset of the dummy components forms a pattern, and the pattern comprises an identifier for the interposer die.

Method and apparatus for tracking interposer dies in a silicon stacked interconnect technology (SSIT) product

A method for tracking an interposer die of a stacked silicon interconnect technology (SSIT) product includes forming a plurality of dummy components on the interposer die, and modifying one or more of the plurality of dummy components on the interposer die to form a unique identifier for the interposer die. An apparatus for a stacked silicon interconnect technology (SSIT) product includes an interposer die, and a plurality of dummy components at the interposer die. One or more of the plurality of dummy components is modifiable to form a unique identifier for the interposer die.

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Pleasanton, CA, United States of America

Myongseob Kim