Advanced Energy Industries, Inc.

Colorado State University Research Foundation

Myeong Yeol Choi

George J Collins

Michael L Mueller

Il-Gyo Koo

Denis M Shaw

Cameron A Moore

Steve Jordan

Jeffrey Roberg

Mike Mueller

Dean A Hendrickson

Doreene Hyatt

Amber Zagrodzki

Jin Hoon Cho

Jeremiah H Collins

Abdur Rahman

Carl W Almgren

Il-gyo Koo

Heesang Youn

A radio-frequency (RF) generator is provided that includes an exciter, a power amplifier, a filter, a sensor, and a frequency-tuning subsystem. The frequency-tuning subsystem includes a non-transitory, tangible, machine-readable medium containing instructions to perform a method that includes receiving an impedance trajectory of the plasma load; receiving a reference point in a complex-reflection-coefficient plane, the reference point lying on a reference vector passing through the reference point and the origin; receiving, from the sensor, a measured impedance of the plasma load; determining a measurement angle between a reference vector and a line passing through the reference point and a point in the complex-reflection-coefficient plane corresponding to the measured impedance; scaling the measurement angle by a predetermined constant to produce a frequency step; adding the frequency step to the initial frequency to produce an adjusted frequency; and causing the exciter to generate a signal oscillating at the adjusted frequency.

Apparatus for frequency tuning in a RF generator

This disclosure describes systems, methods, and apparatus for pulsed RF power delivery to a plasma load for plasma processing of a substrate. In order to maximize power delivery, a calibration phase using a dummy substrate or no substrate in the chamber, is used to ascertain a preferred fixed initial RF frequency for each pulse. This fixed initial RF frequency is then used at the start of each pulse during a processing phase, where a real substrate is used and processed in the chamber.

Frequency tuning for pulsed radio frequency plasma processing

A plasma system is disclosed. The system includes a plasma device including an inner electrode and an outer electrode coaxially disposed around the inner electrode, wherein at least one of the inner electrode and the outer electrode is temperature controlled; an ionizable media source coupled to the plasma device and configured to supply ionizable media thereto; and a power source coupled to the inner and outer electrodes and configured to ignite the ionizable media at the plasma device to form a plasma effluent.

System and method for treatment of biofilms

A plasma device is disclosed. The plasma device includes: at least one electrode including a nanoporous dielectric layer disposed on at least a portion thereof, the nanoporous dielectric layer including a plurality of pores, wherein at least a portion of the plurality of pores include a catalyst embedded therein.

Plasma catalyst chemical reaction apparatus

A method for whitening teeth is disclosed. The method includes supplying a liquid sufficient to at least partially submerge a portion of a tooth; positioning a plasma device adjacent to the submerged portion of the tooth; supplying ionizable media to the plasma device; and igniting the ionizable media at the plasma device sufficient to form a plasma effluent in the presence of the liquid at the distal portion, whereby the plasma effluent reacts with the liquid to form at least one reactive species that interacts selectively with foreign matter disposed on the tooth.

Liquid-gas interface plasma device

Growing community of inventors

Fort Collins, CO, United States of America

Myeong Yeol Choi