Sumitomo Chemical Company, Limited

Sumitomo Chemical Companylimited

Mutsuko Higo

Koji Ichikawa

Shingo Fujita

Kunihito Miyake

Kanako Fukuda

Hironobu Iyama

Kenji Kimura

Hiromu Sakamoto

Masako Sugihara

A resist composition includes a novolak resin in which a hydroxy group is substituted with a group represented by formula (3), an acid generator, a quencher, and a solvent: wherein, in formula (3), Rrepresents a hydrocarbon group having 1 to 20 carbon atoms (e.g., a chain hydrocarbon group such as an alkyl group, an alkenyl group and an alkynyl group, an alicyclic hydrocarbon group, an aromatic hydrocarbon group, groups formed by combining these groups, etc.) and * represents a bond.

Resist composition and method for producing resist pattern

Disclosed are a resin containing a structural unit represented by formula (I), a structural unit represented by formula (a1-1), a structural unit represented by formula (a1-2) and a structural unit represented by formula (a2-A), and a resist composition including the same: 

Resin, resist composition and method for producing resist pattern

Disclosed is a resin including a structural unit represented by formula (I) and a structural unit represented by formula (a2-A), and a resist composition:  wherein Rrepresents a hydrogen atom or a methyl group; Land Leach represent &#x2014;O&#x2014; or &#x2014;S&#x2014;; s1 represents an integer of 1 to 3; s2 represents an integer of 0 to 3; Rrepresents a hydrogen atom, a halogen atom, or an alkyl group which may have a halogen atom; Rrepresents a halogen atom, a hydroxy group, an alkyl group, an alkoxy group, an alkylcarbonyl group or the like; Arepresents a single bond or *&#x2014;X-(A-X)&#x2014;; Arepresents an alkanediyl group; Xand Xeach represent &#x2014;O&#x2014;, &#x2014;CO&#x2014;O&#x2014; or &#x2014;O&#x2014;CO&#x2014;; nb represents 0 or 1; and mb represents an integer of 0 to 4.

Disclosed is a resin including a structural unit represented by formula (a1-5) and a structural unit represented by formula (I), and a resist composition: wherein Rrepresents an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom; Zrepresents a single bond or *&#x2014;(CH)&#x2014;CO-L-; h3 represents an integer of 1 to 4; L, L, Land Leach independently represent &#x2014;O&#x2014; or &#x2014;S&#x2014;; s1 represents an integer of 1 to 3; s1' represents an integer of 0 to 3; Rrepresents a hydrogen atom or a methyl group; Arepresents a single bond or *&#x2014;CO&#x2014;O&#x2014;; Rrepresents a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group; mi represents an integer of 1 to 3; and ni represents an integer of 0 to 4, in which mi+ni&#x2264;5.

A salt represented by formula (I): wherein Rand Rindependently each represent a C6-C18 unsubstituted or substituted aromatic hydrocarbon group,Xrepresents a C1-C12 divalent aliphatic saturated hydrocarbon group in which a methylene group can be replaced by an oxygen atom or a carbonyl group, andArepresents an organic anion.

Salt and photoresist composition containing the same

There is a provided a polyurethane composition, which exhibits an excellent property of preventing discoloring or coloring not only by oxidized nitrogen gases but also by heat, characterized in that

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Osaka, Japan

Mutsuko Higo