Az Electronic Materials USA Corp.

Az Electronic Materials (Luxembourg) S.a.r.l.

Muthiah Thiyagarajan

Yi Cao

SungEun Hong

Hengpeng Wu

Jian Yin

Ralph R Dammel

Mark O Neisser

Munirathna Padmanaban

Takanori Kudo

Srinivasan Chakrapani

Clement Anyadiegwu

Margareta Paunescu

David L Rentkiewicz

Wenbing Kang

Sung Eun Hong

Wen-Bing Kang

The present invention relates a novel aqueous composition comprising polymeric thermal acid generator and a process of coating the novel composition onto photoresist pattern, thereby forming a layer of the polymeric thermal acid generator over the photoresist pattern. The polymeric thermal acid generator comprises a polymer having at least one repeating unit of structure 2; where Rto Rare independently chosen from the group consisting of H and C-Calkyl; Ris chosen from the group consisting of unsubstituted aryl, substituted aryl, alkyl (C-C) and fluoroalkyl (C-C) and W is a C-Calkylene spacer.

Composition comprising a polymeric thermal acid generator and processes thereof

The present invention relates to a method for treating a block copolymer solution, wherein the method comprises: providing a solution comprising a block copolymer in a non aqueous solvent; and, treating the solution to remove metals using an ion exchange resin. The invention also relates to a method of forming patterns using the treated block copolymer.

Methods and materials for removing metals in block copolymers

Photoresist compositions

The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing a lactam group of structure (1) where Ris independently selected hydrogen, C-Calkyl, C-Calkyl alcohol, hydroxy (OH), amine (NH), carboxylic acid, and amide (CONH),&#x2009;represents the attachment to the polymer, m=1-6, and n=1-4. The present invention also relates to a process for manufacturing a microelectronic device comprising providing a substrate with a photoresist pattern, coating the photoresist pattern with the novel coating material reacting a portion of the coating material in contact with the photoresist pattern, and removing a portion of the coating material which is not reacted with a removal solution.

Composition for coating over a photoresist pattern comprising a lactam

The present invention relates to an aqueous coating composition for coating a photoresist pattern, comprising a polymer comprising at least one unit with an alkylamino group, where the unit has a structure (1), where, Rto Rare independently selected from hydrogen and Cto Calkyl, and W is Cto Calkyl. The invention also relates to a process for imaging a photoresist layer using the present composition.

Composition for coating over a photoresist pattern

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Bridgewater, NJ, United States of America

Muthiah Thiyagarajan