Az Electronic Materials USA Corp.

Clariant Finance (bvi) Limited

Az Electronic Materials (luxembourg) S.a.r.l.

Merck Patent Gmbh

Clariant International Ltd

Munirathna Padmanaban

M Dalil Rahman

Takanori Kudo

Ralph R Dammel

Huirong Yao

Hatsuyuki Tanaka

Georg Pawlowski

JoonYeon Cho

Srinivasan Chakrapani

Salem K Mullen

Ken Kimura

Alberto D Dioses

Wen-Bing Kang

Francis Michael Houlihan

Clement Anyadiegwu

Elizabeth Wolfer

Douglas S McKenzie

David L Rentkiewicz

Shinji Miyazaki

SangHo Lee

Shigemasa Nakasugi

Edward W Ng

Venkata Gopal Reddy Chada

Mark O Neisser

Guanyang Lin

Joseph E Oberlander

Yusuke Takano

Yoshinori Nishiwaki

Kazuma Yamamoto

Durairaj Baskaran

Yasushi Akiyama

Muthiah Thiyagarajan

Orest Polishchuk

Andrew R Romano

Jin Li

Stanley A Ficner

Kazunori Kurosawa

John P Sagan

Chi-Sun Hong

Toru Koike

Medhat A Touky

Douglas Mckenzie

Joonyeon Cho

D Alberto Dioses

A coating composition, and uses thereof, including a solvent, metal oxide nanoparticles dispersed in this solvent, and a high carbon polymer dissolved in this solvent, where the high carbon polymer includes a repeat unit of structure (1), a hydroxybiphenyl repeat unit of structure (2) and a moiety containing a fused aromatic containing moiety of structure (3) where Rand Rare independently selected from the group of hydrogen, an alkyl and a substituted alkyl, Ar is an unsubstituted or substituted fused aromatic ring and Xis an alkylene spacer, or a direct valence bound. 

Composition of spin-on materials containing metal oxide nanoparticles and an organic polymer

The present invention relates to new aromatic-amino functional siloxanes, which are compounds comprising one or two tail groups X, and a linking group L of structure (2) linking each said tail group to said head group, wherein the head group X has structure (1), containing an optional organic moiety Y, wherein the attachment point of said tail group Xthrough said linking group L to the head group X, may be, at positions a, b, c, d, or e. Another aspect of this invention are compositions containing these novel aromatic amino functional siloxane. A further aspect of this invention are compositions comprised of the above novel aromatic-amino functional siloxanes, and also the composition resulting from the aging of these compositions at room temperature for about 1 day to about 4 weeks. Still further aspects of this invention are processes for forming self-assembled monolayers on a substrate, from the aged composition, and also the processes of coating these aged compositions on patterned porous dielectrics to cap them also the processes of metallization of these capped pattered porous dielectrics. 

Aromatic amino siloxane functionalized materials for use in capping porous dielectrics

The present invention relates to novel compositions comprising a metal component selected from a group chosen from at least one polyoxometalate, at least one heteropolyoxometalate and a mixture thereof; and, at least one organic component. The present invention also relates to methods of preparing the nanorod arrays and the nanorod materials and films. The present invention also relates to novel compositions to generate metal-oxide rich films, and also relates to processes for via or trench filling, reverse via or trench filling and imaging with underlayers. The materials are useful in wide range of manufacturing applications in many industries, including the semiconductor devices, electro-optical devices and energy storage industry.

Polyoxometalate and heteropolyoxometalate compositions and methods for their use

The present invention relates to a novel spin coatable composition comprising The present invention further relates to processes using the novel compositions.

Spin coatable metallic hard mask compositions and processes thereof

The present disclosure relates to soluble, multi-ligand-substituted metal compounds with improved stability as well as compositions made from them and methods of their use.

Stable metal compounds, their compositions and methods

The present invention relates to novel, soluble, multi-ligand-substituted metal oxide compounds to form metal oxide films with improved stability as well as compositions made from them and methods of their use. Specifically, the invention pertains to compounds having the following structure (I) wherein M is a metal and n is 1 to 20, and wherein at least one of R, R, R, and Ris i) and at least at least one of R, R, R, and Ris ii), where i) is a silicon bearing organic moiety having at least 2 carbons, and ii) is an organic moiety. The invention also relates to spin-coatable compositions of compounds of structure (I) dissolved into a solvent. The present invention further relates to processes using this spin coatable composition to form a coating on a patterned substrate. 

Stable metal compounds as hardmasks and filling materials, their compositions and methods of use

The present invention relates to a novel absorbing antireflective coating composition comprising a novel crosslinkable polymer comprising at least one repeat unit (A) having structure (1), at least one repeat unit (B) having a structure (2), and at least one repeat unit (C) having structure (3) where D is a direct valence bound or C(R)(R) methylene moiety where Rand Rare independently H, C-Calkyl, C-Ccycloalkyl or C-Caryl; Ar, Ar, Arand Arare independently phenylenic and naphthalenic moiety, Rand Rare independently hydrogen or C-Calkyl; and Rand Rare independently hydrogen or C-Calkyl; and a solvent. The invention also relates to a process for forming an image using the novel antireflective coating composition.

Antireflective coating compositions and processes thereof

The present invention provides a cross-linking agent capable of preventing formation of scum from a bottom anti-reflective coating, and also provides a composition for forming a bottom anti-reflection coating containing the agent. The cross-linking agent is a nitrogen-containing aromatic compound having at least one vinyloxy group or N-methoxymethylamide group, and the composition contains the cross-linking agent. The cross-linking agent of the formula (1) can be produced by reaction of a nitrogen-containing aromatic compound, a halogen compound having a vinyloxy group or N-methoxymethylamide group and a basic compound.

Developable bottom anti-reflective coating

There are provided a composition for forming a superfine pattern and a method employing the same for forming a superfine pattern. The composition enables to simply produce a superfine pattern with high mass productivity. The composition comprises perhydropolysilazane (I), silicon-containing polymer (II) having a hydrocarbon group, and a solvent. The mixture of those polymers contains silicon-hydrogen bonds and silicon-hydrocarbon group bonds in such amounts that the number of the silicon-hydrocarbon group bonds is in a ratio of 1 to 44% based on the total number of the silicon-hydrogen bonds and the silicon-hydrocarbon group bonds. The composition is applied on a resist pattern to form a spacer formed of the composition on the side wall of the ridges in the pattern, and then the spacer or a resin layer disposed around the spacer is used as a mask to form a superfine pattern.

Superfine pattern mask, method for production thereof, and method employing the same for forming superfine pattern

The present invention provides a composition for forming a bottom anti-reflective coating, and also provides a photoresist pattern formation method employing that composition. The composition gives a bottom anti-reflective coating used in a lithographic process for manufacturing semiconductor devices, and the coating can be developed with a developing solution for photoresist. The composition contains a solvent, a polymer having a condensed polycyclic aromatic group, and a compound having a maleimide derivative or a maleic anhydride derivative. The composition may further contain a photo acid generator or a crosslinking agent.

Composition for forming a developable bottom antireflective coating

The invention relates to a photoimageable antireflective coating composition capable of forming a pattern by development in an aqueous alkaline solution, comprising, (i) a polymer A soluble in a coating solvent and comprises a chromophore, a crosslinking moiety, and optionally a cleavable group which under acid or thermal conditions produces a functionality which aids in the solubility of the polymer in an aqueous alkaline solution and; (ii) at least one photoacid generator; (iii) a crosslinking agent; (iv) optionally, a thermal acid generator; (v) a polymer B which is soluble in an aqueous alkaline solution prior to development, where polymer B is non-miscible with polymer A and soluble in the coating solvent, and; (vi) a coating solvent composition, and (vii) optionally, a quencher. The invention also relates to a process for imaging the antireflective coating.

Positive-working photoimageable bottom antireflective coating

The present invention relates to an antireflective coating composition comprising a crosslinking agent, a polymer comprising at least one chromophore group and at least one hydroxyl and/or a carboxyl group, and an additive, further where the additive has structure 1 and comprises at least one arylene-hydroxyl moiety, where Y is selected from an carboxylate anion or sulfonate anion, R, R, and Rare independently selected from unsubstituted C-Calkyl, substituted C-Calkyl, aryl and arylene-hydroxyl; X, X, and Xare independently selected from direct valence bond and C-Calkylene group, and, n=1, 2 or 3. The invention further relates to a process for using the composition.

Bottom antireflective coating compositions and processes thereof

Photoresist compositions

The present application relates to a compound of formula A-X&#x2014;B, where (i) A-X&#x2014;B form an ionic compound Ai Xi Bi where Ai and Bi are each individually an organic onium cation; and Xi is anion of the formula Q-R&#x2014;SOor (ii) A-X&#x2014;B form a non-ionic compound Ac-Xc-Bc, where Ai, Bi, Q, R, Ac, Bc, and Xc are defined herein. The compounds are useful as photoactive materials.

Photoactive compounds

The present invention relates to novel photoacid generators.

Growing community of inventors

Bridgewater, NJ, United States of America

Munirathna Padmanaban