Rigaku Corporation

Muneo Yoshida

Hideaki Takahashi

Kazuhiko Omote

Kiyoshi Ogata

Yoshiyasu Ito

Hiroshi Motono

Asao Nakano

Naoki Kawahara

Sei Yoshihara

Shigematsu Asano

Katsutaka Horada

Shiro Umegaki

Takao Kinefuchi

Akifusa Higuchi

An X-ray thin film inspection device according to the present invention has an X-ray irradiation unitmounted in a first rotation arm, an X-ray detectormounted in a second rotation arm, a fluorescence X-ray detectorfor detecting fluorescent X-ray occurring from an inspection target due to irradiation of X-ray, a temperature measuring unitfor measuring the temperature corresponding to the temperature of the X-ray thin film inspection device, and a temperature correcting system (central processing unit) for correcting an inspection position on the basis of the temperature measured by the temperature measuring unit

X-ray thin film inspection device

An X-ray thin film inspection device of the present invention includes an X-ray irradiation unitinstalled on a first rotation arm, an X-ray detectorinstalled on a second rotation arm, and a fluorescence X-ray detectorfor detecting fluorescence X-rays generated from an inspection target upon irradiation of X-rays. The X-ray irradiation unitincludes an X-ray optical elementcomprising a confocal mirror for receiving X-rays radiated from an X-ray tube, reflects plural focused X-ray beams monochromatized at a specific wavelength and focuses the plural focused X-ray beams to a preset focal point, and a slit mechanismfor passing therethrough any number of focused X-ray beams out of the plural focused X-ray beams reflected from the X-ray optical element

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Tokyo, Japan

Muneo Yoshida