Intel Corporation

Mukund Bapna

Doug B Ingerly

Mohammad Enamul Kabir

Keith Zawadzki

Conor P Puls

Babita Dhayal

Avyaya Jayanthinarasimham

Han Li

Hannes Greve

Moisture hermetic guard ring structures for semiconductor devices, related systems, and methods of fabrication are disclosed. Such devices systems, and methods include a guard ring structure laterally surrounding semiconductor devices of a device layer and metal interconnects of an interconnect layer, the guard ring structure extending through the interconnect layer, the device layer, and a bonding layer adjacent one of the interconnect layer or the device layer the bonding layer, and contacting a support substrate coupled to the bonding layer. Such devices systems, and methods may further include via structures having the same material system as the guard ring structure and also extending through the interconnect, the device, and bonding layers and contacting a support substrate.

Moisture hermetic guard ring for semiconductor on insulator devices

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Hillsboro, OR, United States of America

Mukund Bapna