Electronics and Telecommunications Research Institute

Muhan Choi

Choon Gi Choi

Sung-Yool Choi

Provided are a metamaterial structure and a manufacturing method thereof. The metamaterial structure includes a dielectric layer, nanowires penetrating the dielectric layer and arranged in a spacing having negative refraction with respect to an electromagnetic wave incident on the dielectric layer, and coating layers formed between the nanowires and the dielectric layer.

Metamaterial structure and manufacturing method of the same

Provided are an active metamaterial device operating at a high speed and a manufacturing method thereof. The active metamaterial device includes a first dielectric layer, a lower electrode disposed on the first dielectric layer, a second dielectric layer disposed on the lower electrode, metamaterial patterns disposed on the second dielectric layer, a couple layer disposed on the metamaterial patterns and the second dielectric layer, a third dielectric layer disposed on the couple layer, and an upper electrode disposed on the third dielectric layer.

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Daejeon, South Korea

Muhan Choi