Applied Materials, Inc.

National University of Singapore

Muhammad Avicenna Naradipa

Arvind Sundarrajan

Guan Huei See

Prayudi Lianto

Andrivo Rusydi

Methods and apparatus for processing a substrate are provided herein. For example, a method of processing a substrate using extended spectroscopic ellipsometry (ESE) includes directing a beam from an extended spectroscopic ellipsometer toward a surface of a substrate for determining in-situ ESE data therefrom during substrate processing, measuring a change of phase and amplitude in determined in-situ ESE data, and determining various aspects of the surface of the substrate using simultaneously complex dielectric function, optical conductivity, and electronic correlations from a measured change of phase and amplitude in the in-situ ESE data.

Methods and apparatus for processing a substrate

Methods and apparatus for processing a first substrate and a second substrate are provided herein. For example, a method of processing a substrate using extended spectroscopic ellipsometry (ESE) includes directing a beam from an extended spectroscopic ellipsometer toward a first surface of a first substrate and a second surface of a second substrate, which is different than the first substrate, determining in-situ ESE data from each of the first surface and the second surface during processing of the first substrate and the second substrate, measuring a change of phase and amplitude in determined in-situ ESE data, and determining one or more parameters of the first surface of the first substrate and the second surface of the second substrate using simultaneously complex dielectric function, optical conductivity, and electronic correlations from the measured change of phase and amplitude in the in-situ ESE data.

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Singapore, Singapore

Muhammad Avicenna Naradipa