National Central University

Mount-Learn Wu

Jenq-Yang Chang

Che-Lung Hsu

Ya-Lun Tsai

Chih-Ming Wang

Chien-Chieh Lee

Yung-Chih Liu

Yue-Hong Chou

A silicon bulk-micromachining technology is used to fabricate a GMR filter by exploiting the structure of a suspended silicon nitride (SiNx) membrane on the silicon substrate. A first silicon nitride (SiNx) thin film and a second silicon nitride (SiNx) thin film are formed on opposite sides of the silicon substrate. A first opening is defined in the first silicon nitride (SiNx) thin film, and a grating structure is defined in the second silicon nitride (SiNx) thin film. By etching off a portion of the silicon substrate exposed from the first opening until a portion of the second silicon nitride (SiNx) thin film is exposed from the first opening, a light path space is defined.

Guided-mode resonance filter and fabrication method of same

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Taoyuan, Taiwan

Mount-Learn Wu