Rigaku Industrial Corporation

Rigaku Corporation

Motoyuki Yamagami

Akihiro Ikeshita

Hiroyuki Kawakami

Provided is a substrate contamination analysis system capable of individually analyzing impurities present in a film and impurities present on a surface of the film. The substrate contamination analysis system includes: a vapor phase decomposition device configured to expose a film formed on a surface of a first substrate to a gas that reacts with the film, to thereby dissolve the film; a recovery device configured to perform a first recovery operation of moving an object to be measured to a first measurement position before the film is dissolved and a second recovery operation of moving the object to be measured to a second measurement position after the film is dissolved; and an analyzer configured to analyze the object to be measured every time the recovery device performs the first recovery operation and the second recovery operation.

Substrate contamination analysis system

An X-ray fluorescence analyzing system includes: a cassette () in which a substrate () is housed; a vapor phase decomposing device () for dissolving and then drying a measurement object () on a sample substrate surface () to be held thereon; at least one measurement substrate (); a sample recovering device () for dripping and drying a recovery liquid (), which has recovered the measurement object () from the sample substrate (), onto a predetermined dripping position on a measurement substrate surface () to hold the recovery liquid () thereon; an X-ray fluorescence spectrometer (); a conveying device () for conveying the substrate (); and a control device () for controlling the devices (). The recovery liquids () of the measurement objects () from a plurality of the sample substrates () are dripped and dried on the single measurement substrate surface () to be measured.

X-ray fluorescence analyzing system

An X-ray fluorescence spectrometric system includes a sample pre-treatment apparatusfor retaining on a surface of a substrate a substance to be measured that is found on the surface of the substrate, after such substance has been dissolved and subsequently dried, an X-ray fluorescence spectrometerand a transport apparatusfor transporting the substrate from the sample pre-treatment apparatus towards the X-ray fluorescence spectrometer, which system as a whole is easy to operate. This spectrometric system also includes a control apparatusfor controlling the sample pre-treatment apparatus, the X-ray fluorescence spectrometerand the transport apparatusin a totalized fashion.

X-ray fluorescence spectrometric system and a program for use therein

A sample preprocessing system for a fluorescent X-ray analysis includes a sample preprocessing apparatus for retaining on a surface of a substrate a substance to be measured that is found on the surface of the substrate, after such substance has been dissolved and subsequently dried, a transport apparatus for transporting the substrate, and a control apparatus for controlling the sample preprocessing apparatus and the transport apparatus. The control apparatus after having confirmed that the pressure difference between inside and outside of the apparatus ( ) and the concentration of the reactive gas within the apparatus are within a predetermined range causes automatically opening and closing shutters and to thereby avoid a possible corrosion of the apparatuses positioned outside the sample preprocessing apparatus while increasing the service lifetime thereof.

Sample preprocessing system for a fluorescent X-ray analysis and X-ray fluorescence spectrometric system using the same

In order to render the value of the fluorescent X-ray strength Ia of a standard sample 2 multiplied by the ratio PF /PF between respective grading coefficients of standard samples 1 and 2 to approach the value of the fluorescent X-ray strength Ia of the standard sample 1, specific glancing angles &oslash;a* and &oslash;b* are determined. The abundance of a substance of interest is determined from fluorescent X-ray strengths Ia and Ib of a sample to be measured that is irradiated at the determined specific glancing angles &oslash;a* and &oslash;b*, to thereby provide an accurate determination of the abundance of the substance of interest.

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Takatsuki, Japan

Motoyuki Yamagami