Shin-Etsu Chemical Co., Ltd.

Nippon Telegraph and Telephone Corporation

Motoyuki Yamada

Osamu Watanabe

Fujio Yagihashi

Tomoyoshi Furihata

Minoru Takamizawa

Akira Hayashida

Shigeru Maida

Shoji Akiyama

Hisatoshi Otsuka

Toru Nakanishi

Haruo Okamoto

Koji Matsuo

Takahiro Iizuka

Kazutoshi Numanami

Akira Yamamoto

Yoshio Kawai

Tetsuo Nakanishi

Akinobu Tanaka

Hiromi Ohsaki

Kazuo Shirota

Hiroshi Ban

Kazuyuki Taniguchi

Yoshiyasu Yamada

Yoshinobu Isono

Nobuaki Urasato

Here are disclosed a pellicle for EUV and an assembly made up of this pellicle and a mask, which brings about a projection of low contrast (intensity) shadows of a mesh structure on the mask, thus minimizing the adverse effect of the shadow on the lithographic printing; also a method for assembling such assembly is disclosed wherein the pellicle is rotated relative to the mask to minimize the shadow contrast, in terms of a contrast ratio, of the mesh structure; the angle of the rotation is 30 degrees or smaller, and the resultant contrast ratio should be 25% or lower.

Pellicle for EUV, and an assembly including the pellicle, and a method for assembling the same

The present invention intends to provide silicon-containing particles that, when used as a negative electrode active material for a nonaqueous electrolyte secondary battery, can form a nonaqueous electrolyte secondary battery that is less in volume change during charge/discharge and has high initial efficiency and excellent cycle characteristics. The present invention provides silicon-containing particles that are used as a negative electrode active material for a nonaqueous electrolyte secondary battery and have a diffraction line with a peak at 2&#x3b8;=28.6&#xb0; in X-ray diffractometry, a negative electrode material for a nonaqueous electrolyte secondary battery therewith, a nonaqueous electrolyte secondary battery, and a method of manufacturing the silicon-containing particles.

Silicon-containing particles, negative electrode material for nonaqueous electrolyte secondary battery using the same, nonaqueous electrolyte secondary battery, and method of manufacturing silicon-containing particles

A pellicle for EUV including a silicon film and a mesh work structure supporting the silicon film, and this pellicle is improved in that the grid frames of the mesh work structure are tapered in such a manner that the width of each grid frame lessens as the distance from the silicon film is increased.

Pellicle for EUV

A titania-doped quartz glass containing 3-12 wt % of titania at a titania concentration gradient less than or equal to 0.01 wt %/&#x3bc;m and having an apparent transmittance to 440 nm wavelength light of at least 30% at a thickness of 6.35 mm is of such homogeneity that it provides a high surface accuracy as required for EUV lithographic members, typically EUV lithographic photomask substrates.

Titania-doped quartz glass and making method, EUV lithographic member and photomask substrate

Synthetic quartz glass is produced by feeding a silica-forming raw material gas, hydrogen gas, oxygen gas and a fluorine compound gas from a burner to a reaction zone, flame hydrolyzing the silica-forming raw material gas in the reaction zone to form fine particles of fluorine-containing silica, depositing the silica fine particles on a rotatable substrate in the reaction zone so as to create a fluorine-containing porous silica matrix, and heat vitrifying the porous silica matrix in a fluorine compound gas-containing atmosphere. This process enables the low-cost manufacture of a synthetic quartz glass having a higher and more uniform transmittance to light in the vacuum ultraviolet region than has hitherto been achieved.

Method of producing fluorine-containing synthetic quartz glass

A process for manufacturing synthetic quartz glass involves feeding a quartz glass-forming raw material to a high-temperature gas zone within a chamber, converting the quartz glass-forming raw material into quartz soot, and forming synthetic quartz glass from the soot. A suspended soot-discharging gas which has been flow-straightened in a suspended soot discharging direction flows through the chamber in the vicinity of the high-temperature gas zone. This process keeps free suspended soot from settling onto the surface of the quartz ingot where fusion and growth take place, thereby preventing the formation of bubbles within the quartz glass under growth.

Synthetic quartz glass manufacturing process

A polyhydroxystyrene having a 2,4-diamino-s-triazinyl group substituted for 1-50 mol % of its hydroxyl group and a weight average molecular weight of 3,000-50,000 is provided. A negative radiation-sensitive resist composition comprising the polymer, preferably along with a photo-acid generator and a crosslinking agent has high resolution and developability, affords a resist pattern of rectangular profile, and is shelf stable. The composition is thus very useful as resist material for LSI manufacture.

2,4-diamino-s-triazinyl group-containing polymer and negative

Provided is a poly(para-t-butoxycarbonyloxystyrene) having recurring units of the formula: ##STR1## which is prepared by anionic polymerization of para-t-butoxycarbonyloxystyrene. The polymer is of a controlled molecular weight and a narrow molecular weight distribution and has a high degree of resolution and development, meeting the requirements of resist materials. The method allows for simple preparation of such polymers.

Poly(para-T-butoxycarbonyloxystyrene) and method of making

A polystyrene type monodispersion polymer having at least a monomer unit represented by the following general formula (I), and having a molecular weight which lies in the range 500-500,000 and manufacturing process thereof are disclosed; ##STR1## where R is a hydrogen atom or methyl group, and the R in the molecule may be identical or different.

Polymer having a narrow dispersion of molecular weight and a

A positive resists material for high energy-sensitive positive resists which can be developed in aqueous alkali solution, said material comprising (A) a polyhydroxystyrene resin wherein some hydroxyl groups are substituted by t-butoxycarbonyloxy groups, (B) a solution blocking agent, and (C) an onium salt, and being characterized in that said solution blocking agent contains at least one t-butoxycarbonyloxy group per molecule, said onium salt is bis(p-t-butylphenyl) iodinium trifluormethylsulfonate represented by the following formula (1): ##STR1## and the weight proportions of (A), (B), (C) are given by the relations: 0.07.ltoreq.B-.ltoreq.0.40, 0.005.ltoreq.C.ltoreq.0.15, 0.55.ltoreq.A, A+B+C=1. As the resist has low absorption at the exposure wavelength of a KrF exima laser, a fine pattern having vertical walls is easily formed.

Positive resist material

A resist based on a living polymer is provided. Living anionic polymerization of p-alkoxycarbonylstyrene monomers results in polymers having a molecular weight distribution (Mw/Mn) of from 1 to 1.4.

Resist compositions

A p-vinylphenoxydimethylphenylcalbyldimethylsilane homopolymer having a molecular weight dispersion narrow enough to ensure high resolution and high developability to resists containing said homopolymer as main component can be manufactured by anionic polymerization of a p-vinylphenoxydimethylphenylcalbyldimethylsilane monomer.

P-vinylphenoxydimethylphenylcarbyldimethylsilane homopolymer

A lithium cell having excellent discharging and recharging characteristics is proposed which is characteristic in the unique formulation of the polymeric solid electrolyte composition having a high ionic conductivity to fill the space between the anode and the cathode. The electrolyte composition comprises: (a) a block copolymer of styrene and 4-hydroxystyrene, of which the phenolic hydroxy groups in the 4-hydroxystyrene moiety are substituted by the grafting chains of poly(ethylene oxide) moiety having a specified chain length, (b) an ionic lithium salt and (c) a poly(ethylene oxide) in a specified weight proportion.

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Annaka, Japan

Motoyuki Yamada