Fujifilm Corporation

Fujinon Corporation

Mototaka Kanaya

Hiroki Takahashi

Shinichiro Sonoda

Tatsuya Yoshihiro

Shuji Akiya

The antireflection film is provided on a surface of a light-transmitting substrate and includes a thin multi-layer film and a fine unevenness layer that are laminated in this order from the substrate side. The thin multi-layer film includes multiple layers. The fine unevenness layer has a structure in which an uneven structure having a shorter average pitch than a wavelength of used light is provided and in which a refractive index to the used light changes continuously depending on a continuous change in a space occupation of the uneven structure in a thickness direction of the thin multi-layer film. The multiple layers include: an oxide film having a relatively high refractive index that is formed of at least two metal elements or is formed of silicon and at least one metal element; and an oxynitride film having a relatively low refractive index.

Antireflection film and optical member including antireflection film

The invention provides an optical component, an infrared camera including the optical component, and a method for manufacturing the optical component. Antireflection materialsA are formed on a chalcogenide glassof which a compositional ratio of germanium and selenium is 60 percent or greater. With respect to the antireflection materialsA, an extinction coefficient to light of 10.5 &#x3bc;m is 0.01 or less, and a refractive index to light having a wavelength of 10.5 &#x3bc;m are greater than 1 and 2.6 or less. The antireflection materialsA are formed on a surface of a chalcogenide glassat an interval of 0.5 &#x3bc;m to 2.0 &#x3bc;m, so as to form an antireflection film. Adhesiveness of the antireflection filmis higher than that In a case where the surface of the chalcogenide glassis evenly coated with the antireflection materialsA.

Optical component, infrared camera, and method for manufacturing optical component

An antireflection multilayer film is formed by alternately laminating high refractive index layers and low refractive index layers having indexes of refraction different from each other. The high refractive index layer is an oblique deposition layer formed by depositing an inorganic material such as tantalum pentoxide onto the surface of an optical element from a diagonal direction, and has minute internal structures composed of slant columnar structures growing along to the deposition direction. The low refractive index layer is an isotropic and dense layer.

Antireflection multilayer film

Two types of layers are simultaneously formed on a substrate and another substrate under the same layer forming condition, the heights of which are equal to a half height of an intended retardation compensation layer. Physical properties of the respective two types of layers formed on the substrates are identical to each other, and if deviations are produced in retardation distribution characteristics for azimuth angles of incident light, these deviations are commonly provided in the respective two types of layers. When one substrate is superposed with the other substrate and these superposed substrates are integrated with each other in order to make a single sheet of retardation compensation element, after one of these substrates is rotated by an angle of 90 degrees with respect to the other substrate, these substrates are stuck to each other by an adhesive agent.

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Sano, Japan

Mototaka Kanaya