Tokyo Electron Limited

Motoshi Fukudome

Masayuki Kitamura

Jun Yoshikawa

Shingo Hishiya

Kyoko Ikeda

Daisuke Toriya

Kazuyoshi Matsuzaki

Einosuke Tsuda

Kazuo Yabe

Tomoyuki Nagata

Tatsuya Miyahara

Eiji Kikama

Nobutoshi Terasawa

Kosuke Yamamoto

Ken Itabashi

Satoshi Takeda

Naoshige Fushimi

Satoshi Yonekura

Fumiaki Nagai

Yuki Tanabe

Hiroaki Kikuchi

Kazuaki Sasaki

An abnormality detection method includes: supplying a gas controlled to a selected rate to a gas supply pipe via the gas pipe connected to the gas supply pipe, thereby introducing the gas into a reaction region of a processing container provided in a processing apparatus from a gas hole of the gas supply pipe; measuring a pressure inside the gas pipe by a pressure gauge attached to the gas pipe; and detecting an abnormality of at least one of the gas supply pipe and the gas pipe based on the pressure measured at the measuring.

Abnormality detection method and processing apparatus

A learning device for performing a machine learning based on a learning model using data input to an input layer, includes: a calculation part configured to calculate a predetermined number of features, in which simulation data as a result of simulating semiconductor manufacturing processes by setting environmental information inside a process vessel in which the semiconductor manufacturing processes are performed and using a predetermined component provided in the process vessel as a variable, and XY coordinates parallel to a plane of a wafer are associated with each other; and an input part configured to input the calculated predetermined number of features to the input layer.

Learning device, inference device, and learned model

The present invention provides a substrate stage and a substrate processing apparatus that appropriately control a temperature of a staging surface on which a substrate is placed. The substrate stage includes a stage base including a cooling surface therein, and a supply flow path forming member formed of a material having a lower thermal conductivity than that of the stage base and including cooling nozzles configured to spray a coolant toward the cooling surface.

Substrate stage and substrate processing apparatus

Disclosed is a substrate processing method including: placing a plurality of substrates on a rotary table in a processing container; and performing a processing on the substrates while rotating the rotary table. A dummy workpiece is disposed in a gap between the substrates placed on the rotary table.

Substrate processing method and substrate processing apparatus

Growing community of inventors

Nirasaki, Japan

Motoshi Fukudome