Nippon Telegraph and Telephone Corporation

Sumco Corporation

Motonori Nakamura

Ippei Shake

Midori Kodama

Atsuhiko Maeda

Masayuki Tsuji

Takahiro Hata

Nobuhiko Matsuura

An infectious disease prevention supporting device according to an embodiment of the present invention is an infectious disease prevention supporting device including a processor. The processor is configured to perform a detection process that detects a motion of a forearm or a wrist by a user, a proximity determination process that determines whether the user's hand is in proximity to a mucosa of the user's face based on the motion detected by the detection process for a predetermined period of time, and a warning generation process that generates a warning to suppress the proximity of the user's hand to the mucosa when it is determined by the proximity determination process that the user's hand is in proximity to the mucosa.

Infectious disease prevention supporting device, method and program

Provided is a highly reliable technology for optimizing an action for controlling an environment in a target space. An action optimization device for optimizing an action for controlling an environment: acquires environmental data related to a state of the environment; performs time/space interpolation on the acquired environmental data; trains an environment reproduction model, based on the time/space-interpolated environmental data, such that, when a state of an environment and an action for controlling the environment are input, a correct answer value for an environmental state after the action is output; trains an exploration model such that an action to be taken next is output when an environmental state output from the environment reproduction model is input; predicts a second environmental state corresponding to a first environmental state and a first action by using the trained environment reproduction model; explores for a second action to be taken for the second environmental state; and outputs a result of the exploration.

Action optimization device, method and program

A hand washing supporting device according to embodiments is a hand washing supporting device including a processor, in which the processor is configured to perform a detection process that detects, upon detecting the motion of the hand by the user for a predetermined period of time by the detection process, a motion of a hand by a user, a determination process that determines a start of hand washing by the user, and a notification process that notifies, in accordance with a determination of the start of the hand washing by the determination process, the user of a difference between time required from the start to an end of the hand washing by the user and the predetermined period of time.

Hand washing supporting device, method and program

Provided is a method of producing an epitaxial silicon wafer, which is excellent in productivity and prevents the formation of a backside haze in consecutive single-wafer processing epitaxial growth procedures on a plurality of silicon wafers without cleaning a process chamber after each epitaxial growth procedure. The method of producing an epitaxial silicon wafer includes: a step of loading a silicon wafer; a step of forming a silicon epitaxial layer; a step of unloading the silicon wafer; and a cleaning step. The cleaning step is performed before and after repeating a predetermined number of times a series of growth procedures including the silicon wafer loading step, the silicon epitaxial layer formation step, and the silicon wafer unloading step.

Growing community of inventors

Tokyo, Japan

Motonori Nakamura