Hitachi Metals, Ltd.

Motoki Wakano

Nobuhiko Chiwata

Takeyuki Itabashi

Hisashi Tanie

Minoru Yamada

A metal particle having a particle diameter of 10 &#x3bc;m or more and 1000 &#x3bc;m or less and includes Cu and trace elements and a total mass content of P and S, among other trace elements, is 3 ppm or more and 30 ppm or less. A method for producing a metal particle including producing a molten metal material by melting a metal material in a crucible, wherein Cu as determined in GDMS analysis is over 99.995% and a total of P and S is 3 ppm or more and 30 ppm or less; applying a pressure of 0.05 MPa or more and 1.0 MPa or less to drip the molten metal material through an orifice, thereby producing a molten metal droplet; and rapidly solidifying the molten metal droplet using an inert gas whose oxygen concentration is 1000 ppm or less.

Metal particle and method for producing the same, covered metal particle, and metal powder

A semiconductor device having stacked semiconductor chips is provided wherein alignment of even thin semiconductor chips of a large warpage is easy and thus high assembling accuracy and high reliability are ensured. Semiconductor chips having hollow through-silicon via electrodes each formed with a tapered portion are melt-joined using solder balls each having a core of a material higher in melting point than solder. When melt-joining the semiconductor chips, the temperature is raised while imparting an urging load to stacked semiconductor chips, thereby correcting warpage of the semiconductor chips. In each chip-to-chip connection thus formed, if the connection is to prevent the occurrence of stress around the electrode due to the urging load, a solder ball having a core of a smaller diameter than in the other connections is used in the connection.

Semiconductor device including arrangement to control connection height and alignment between a plurity of stacked semiconductor chips

A novel structure capable of reducing the stress in the insulating layer in the semiconductor element and thereby securing reliability is provided. When the semiconductor element and the substrate are connected with a solder, the stress generated in the insulating layer is reduced by placing a spherical core made of a material having a greater rigidity inside the solder and satisfying the following inequalities: 1 GPa&#x3c;(Young's modulus of a encapsulation resin)&#x3c;30 GPa, 20 ppm/k&#x3c;(linear coefficient of expansion of the encapsulation resin)&#x3c;200 ppm/k, and 10 MPa&#x3c;(yield stress of the solder at room temperature)&#x3c;30 MPa. At the time of connection, the thickness of the solder to be placed between the land on the surface of the semiconductor element and the core is adjusted to 1/10 or less of the terminal pitch.

Semiconductor device

The invention provides a solder alloy containing, by mass, 2.0 to 15.0% of Ag, 0.1 to 6.0% of Al, 0.01 to 0.50% of Y, the balance being Sn and unavoidable impurities. The solder alloy preferably contains 0.01 to 0.50% of Ge by mass. The solder alloy of the invention is suited to bonding oxides together and the oxides preferably comprise glass. The invention provides a glass bonded body formed by bonding glasses with the use of the solder alloy.

Growing community of inventors

Yasugi, Japan

Motoki Wakano