Mitsubishi Chemical Corporation

Mitsubishi Heavy Industries Limited

Tomoe Engineering Co., Ltd.

Motoki Numata

Kazuto Kobayashi

Yoshio Seiki

Hiroyuki Osora

Noritaka Matsumoto

Atsushi Onodera

Jun Ohashi

Koji Fujimoto

Yoshiyuki Takeuchi

Keiichi Akimoto

Takayuki Isogai

Katsunori Fukuda

Hiroaki Shimazu

A separation system has a distillation column, an overhead vapor supply pipe connected to the top of the distillation column, first and second branch pipes branching from the overhead vapor supply pipe and a superheater connected to the first branch pipe. A separator downstream of the superheater has a separation membrane for separating overhead vapor from the top of the distillation column into permeable vapor and nonpermeable vapor by allowing only a selected portion of the overhead vapor to permeate the separation membrane. A reflux unit has a condenser connected to the second branch pipe for cooling a portion of the overhead vapor into a liquid and a gas-liquid separator for separating gas from the liquid produced by cooling and returning the separated liquid into the top of the distillation column.

Separator for producing aromatic carboxylic acids

A screen bowl type centrifugal separator which can not only eliminate the problem of the productivity being lowered resulting from the occurrence of clogging with the crystals in the screen part, but also minimize the amount of leakage of the object to be treated in the screen part. Inside of the hub () of the screw conveyor (), a cleaning liquid receiving part () which receives the cleaning liquid for the cleaning nozzle () is provided, and further, in the cleaning liquid receiving part (), a residual layer crystal cleaning liquid receiving part () which receives the cleaning liquid for cleaning the residual layer object to be treated in the screen part () is provided, being partitioned independently of the inside of the cleaning liquid receiving part (). The cleaning liquid which has been supplied to the inside of the residual layer crystal cleaning liquid receiving part () is jet spouted directly toward the residual layer object to be treated from the outer circumferential edge of the flight () through the residual layer crystal cleaning liquid path provided along the direction of the helix of the flight (), with no relation to said cleaning liquid receiving part ().

Centrifugal machine

Growing community of inventors

Kitakyusyu, Japan

Motoki Numata