Tokyo Electron Limited

Motoi Okada

Takuro Tsutsui

Kei Sano

Shuji Iwanaga

Yuichiro Kunugimoto

Yasutoshi Umehara

Junya Sato

Junnosuke Maki

Nao Akashi

Takafumi Hayama

Atsushi Suzuki

Keishi Hamada

Shoki Hamaguchi

Shigeyuki Iida

Atsushi Ohta

Masaomi Toyonaga

Mistsuteru Yano

Yuta Haga

Hiroyuki Sato

Takayuki Kita

Kiwamu Tsukino

An abnormality detection apparatus is provided. The abnormality detection apparatus includes a first generation part configured to generate pseudo-abnormal image data by synthesizing a substantially circular image at a random position of an image of normal image data obtained by photographing equipment that includes a liquid supply and supplies a liquid from the liquid supply without an abnormality, a second generation part configured to generate a determination model for determining whether the equipment is normal or abnormal by performing learning of the normal image data and the pseudo-abnormal image data, an acquisition part configured to acquire image data obtained by photographing the equipment, and a detection part configured detect an abnormality in the equipment from the image data acquired by the acquisition part using the determination model.

Abnormality detection apparatus and abnormality detection method

A monitoring apparatus for a substrate processing apparatus includes: an imaging unit that captures an image of a nozzle of the substrate processing apparatus and a surface of a substrate held by a substrate holder of the substrate processing apparatus; a monitoring data generation unit that generates monitoring video data based on imaging video data captured by the imaging unit during an execution of a substrate process performed by the substrate processing apparatus including a first process and a second process; and a monitoring condition changing unit that changes a generation condition of the monitoring video data during the execution of the substrate process so that at least a resolution or a number of frames of the monitoring video data during an execution of the second process is different from the monitoring video data during an execution of the first process.

Substrate processing monitoring apparatus based on imaging video data, substrate processing apparatus, substrate processing monitoring method, and storage medium

A state determination device determines the state of a drive mechanism configured to operate while holding a substrate in a substrate processing apparatus. The state determination part includes: an acquisition part configured to acquire operation data for the drive mechanism; a model generation part configured to generate a monitoring model for the drive mechanism by executing machine learning using an auto-encoder based on normal operation data that is derived from the operation data acquired by the acquisition part when the drive mechanism is operating normally; and a first determination part configured to determine the state of the drive mechanism based on first output data obtained by inputting, to the monitoring model, evaluation data that is derived from the operation data acquired by the acquisition part when the drive mechanism is being evaluated.

State determination device, state determination method, and computer-readable recording medium

According to an aspect of the present disclosure, a substrate state determining apparatus includes: an image capturing unit that captures an image of a substrate placed on a stage; a learning unit that executes a machine learning using training data in which information indicating a state of the substrate is attached to the image of the substrate, so as to generate a substrate state determination model in which the image of the substrate is taken as an input and a value related to the state of the substrate corresponding to the image of the substrate is taken as an output; and a determination unit that determines the state of the substrate corresponding to the image of the substrate captured by the image capturing unit, using the substrate state determination model generated by the learning unit.

Substrate state determining apparatus, substrate processing apparatus, model generating apparatus, and substrate state determining method

Disclosed is monitoring device of monitoring a state of a substrate processing process in a substrate processing apparatus. The monitoring device includes: an imaging unit configured to image a processing state of the substrate processing process; a storage unit; a storage control unit configured to store a moving picture imaged by the imaging unit after adding a time stamp to the moving picture; a group classification unit configured to group a plurality of moving pictures stored in the storage unit into moving pictures of a normal group and moving pictures of a group other than the normal group; and a threshold generation unit configured to generate a threshold for detecting an abnormal moving picture based on the moving pictures of the normal group grouped by the group classification unit.

Substrate processing apparatus, monitoring device of substrate processing apparatus, and monitoring method of substrate processing apparatus

Provide is a process monitoring device in a semiconductor manufacturing apparatus that can readily and reliably monitor the process in the semiconductor manufacturing apparatus. The process monitoring device includes a storage unit that stores a normal state moving image data indicating a normal state of the process; an image capturing unit that captures an image of a state of the process to be monitored to acquire a moving image data; an abnormality level calculation unit configured to extract a feature amount for each frame of the moving image data and the normal state moving image data, and calculate an abnormality level based on the extracted feature amount; and a display unit that displays the abnormality level calculated by the abnormality level calculation unit in association with a frame position of the moving image data.

Process monitoring device and process monitoring method in semiconductor manufacturing apparatus and semiconductor manufacturing apparatus

Growing community of inventors

Sapporo, Japan

Motoi Okada