Shimadzu Corporation

Ebara Corporation

Osaka Prefecture University Public Corporation

Motoaki Adachi

Kikuo Okuyama

Toshiaki Fujii

Shinichiro Totoki

Hiroshi Okuda

Haruo Shimaoka

Daiji Okuda

Akihiro Fukai

Shigeru Kimoto

Michio Higuchi

An ionization device includes an ionization chamber () and a charging chamber () separately prepared therefrom. The ionization chamber () has a discharge electrode () and an opposing electrode () in an interior () of a case having an ionizing gas introducing inlet (). The opposing electrode () has an orifice () communicating with outside and formed at a position opposing the tip end of the discharge electrode (). The charging chamber () is arranged adjacent to the orifice () side of the ionization chamber (). An introduction inlet () of a charge object introduction portion of the charging chamber () is arranged at the position near the exit of the orifice (). The size of the orifice () is set so that the charge object is sucked therein by a negative pressure generated when a gas containing ions is sprayed from the exit of the orifice () into the charging chamber () and the ionization chamber () has a higher pressure than the charging chamber ().

Ionization device

Suspended particulate matter in the atmospheric air is sucked into a container by a pump. The suspended particulate matter in the atmospheric air in the container is electrically charged so as to electrically collect it. The collected suspended particulate matter is irradiated with laser beams under the condition that the collected suspended particulate matter is dispersed at an appropriate concentration. A spatial intensity distribution of diffracted and scattered light obtained by irradiating laser beams to the suspended particulate matter is measured. A particle size distribution of the suspended particulate matter P is found from the result of measurement.

Method and apparatus for measuring suspended particulate matter

A method an apparatus for chemical vapor deposition for producing a thin film. The method includes the steps of: introducing a reactive gas into a reaction chamber wherein a substrate is supported in the reaction chamber; combining charged particles with a component of the reactive gas for ionizing the component; and electrostatically depositing the ionized component onto the substrate in an electric field. Charged particles may be photoelectrons or positive or negative ions produced by discharge. The reactive gas may be solely an ingredient gas containing a component for a thin film or a mixture of the ingredient gas and an oxidizing or reducing gas. The apparatus includes a reaction chamber including a support for a substrate, a device for introducing a reactive gas into the reaction chamber, an electric discharge device, and a device for forming an electric field in the reaction chamber in a direction to the support for the substrate, and an outlet for discharging the reactive gas.

Chemical vapor deposition method and chemical vapor deposition apparatus

Growing community of inventors

Osaka, Japan

Motoaki Adachi