Kla Tencor Corporation

Moshe Markowitz

Amnon Manassen

Andrew V Hill

Daniel Kandel

Ohad Bachar

Alexander Svizher

Ilan Sela

Efraim Rotem

Yung-Ho Alex Chuang

Vladimir Levinski

Daria Negri

Joel L Seligson

Andrei V Shchegrov

Mark Ghinovker

Ilya Bezel

Anatoly Shchemelinin

Lawrence D Rotter

Gregory Brady

Derrick A Shaughnessy

Avi Abramov

Muzammil A Arain

Anatoly Vasiliev

Yaron Ish-Shalom

Anatoly A Vasiliev

James Andrew Allen

Oleg Shulepov

Maxim Khokhlov

Oleg Tsibulevsky

James Allen

Anatoly Shcemelinin

A system for providing illumination to a measurement head for optical metrology is configured to combine illumination beams from a plurality of illumination sources to deliver illumination at one or more selected wavelengths to the measurement head. The intensity and/or spatial coherence of illumination delivered to the measurement head is controlled. Illumination at one or more selected wavelengths is delivered from a broadband illumination source configured for providing illumination at a continuous range of wavelengths.

Systems for providing illumination in optical metrology

The disclosure is directed to systems for providing illumination to a measurement head for optical metrology. In some embodiments of the disclosure, illumination beams from a plurality of illumination sources are combined to deliver illumination at one or more selected wavelengths to the measurement head. In some embodiments of the disclosure, intensity and/or spatial coherence of illumination delivered to the measurement head is controlled. In some embodiments of the disclosure, illumination at one or more selected wavelengths is delivered from a broadband illumination source configured for providing illumination at a continuous range of wavelengths.

Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.

Metrology systems and methods

Various metrology systems and methods are provided.

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Haifa, Israel

Moshe Markowitz